Chinese Journal of Lasers, Volume. 39, Issue 3, 303007(2012)

Subsurface Damage Characterization of Ground Fused Silica by HF Etching Combined with Polishing Layer by Layer

Yang Minghong1,2、*, Zhao Yuan′an1, Yi Kui1, and Shao Jianda1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less

    Subsurface damage would be inevitably formed during grinding of brittle material. The characterization and removal of the subsurface damage remains the main concern to acquire the high laser-induced damage threshold fused silica optics. Several subsurface damage characterization techniques are revieved, in which the feasibility of etching and surface peak-to-valley (PV) roughness method is revaluated experimentally and the error is also analyzed. Herein a new subsurface damage characterization using HF etching and polishing layer by layer is proposed. Then, these subsurface damage characterization techniques are compared in applying to ground fused silica samples. And a good concordance between different measurements is found.

    Tools

    Get Citation

    Copy Citation Text

    Yang Minghong, Zhao Yuan′an, Yi Kui, Shao Jianda. Subsurface Damage Characterization of Ground Fused Silica by HF Etching Combined with Polishing Layer by Layer[J]. Chinese Journal of Lasers, 2012, 39(3): 303007

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: laser manufacturing

    Received: Nov. 7, 2011

    Accepted: --

    Published Online: Jan. 17, 2012

    The Author Email: Minghong Yang (yangmh@siom.ac.cn)

    DOI:10.3788/cjl201239.0303007

    Topics