Acta Optica Sinica, Volume. 36, Issue 1, 105003(2016)

High-Precision Alignment Technique with Large Measurement Range Based on Composite Gratings

Si Xinchun1,2、*, Tang Yan1, Hu Song1, Liu Junbo1,2, Cheng Yiguang1,2, Hu Tao1, Zhou Yi1,2, and Deng Qinyuan1,2
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less
    References(15)

    [1] [1] Chou S Y, Krauss P R, Zhang W, et al.. Sub-10 nm imprint lithography and applications[J]. Journal of Vacuum Science & Technology B, 1997, 15(6): 2897-2904.

    [2] [2] Fang N, Lee H, Sun C, et al.. Sub-diffraction-limited optical imaging with a silver superlens[J]. Science, 2005, 308(5721): 534-537.

    [3] [3] Yao Hanming. Optical Projection Micro-Nano Processing Technology[M]. Beijing: Beijing University of Technology, 2006.

    [4] [4] Xie Changing, Zhu Xiaoli, Niu Jiebin, et al.. Micro-and nano-metal structures fabrication technology and applications[J]. Acta Optica Sinica, 2011, 31(9): 0900128.

    [6] [6] Zhu Jiangping, Hu Song, Yu Junsheng, et al.. Theoretical analysis of photolithography alignment and calibration method based on moiré fringes[J]. Acta Optica Sinica, 2012, 32(6): 0607001.

    [7] [7] Jiangping Zhu, Song Hu, Junsheng Yu, et al.. Four-quadrant grating moiré fringe alignment measurement in proximity lithography[J]. Opt Express, 2013, 21(3): 3463-3473.

    [8] [8] Zhu Jiangping, Hu Song, Yu Junsheng, et al.. Calibration method for mask imaging in lithography alignment[J]. Chinese J Lasers, 2013, 40(1): 0108002.

    [9] [9] Di Chengliang, Yan Wei, Hu Song, et al.. Moiré-based absolute interferometry with large measurement range in wafer-mask alignment [J]. IEEE Photon Technol Lett, 2014, 27(4): 435-438.

    [12] [12] Shaolin Zhou, Yongqi Fu, Xiaoping Tang, et al.. Fourier-based analysis of moiré fringe patterns of superposed gratings in alignment of nanolithography[J]. Opt Express, 2008, 16(11): 7869-7880.

    [14] [14] Chen Chen, Liu Ke, Li Yanqiu, et al.. Two-dimensional virtual grating phase shifting moiré fringe method of phase extraction[J]. Chinese J Laser, 2015, 42(2): 0208004.

    [15] [15] Shaolin Zhou, Yong Yang, Lixin Zhao, et al.. Tilt-modulated spatial phase imaging method for wafer-mask leveling in proximity lithography [J]. Opt Lett, 2010, 35(18): 3132-3134.

    CLP Journals

    [1] ZHU Ge, ZHANG Chao, FU Min, PAN Shuai-jia, LEI Chuan. Developement of alternating light field space-time coupling type displacement measuring system[J]. Optics and Precision Engineering, 2017, 25(8): 2011

    [2] Du Juyou, Dai Fengzhao, Bu Yang, Wang Xiangzhao. Alignment Technique Using Moire Fringes Based on Self-Coherence in Lithographic Tools[J]. Chinese Journal of Lasers, 2017, 44(12): 1204006

    Tools

    Get Citation

    Copy Citation Text

    Si Xinchun, Tang Yan, Hu Song, Liu Junbo, Cheng Yiguang, Hu Tao, Zhou Yi, Deng Qinyuan. High-Precision Alignment Technique with Large Measurement Range Based on Composite Gratings[J]. Acta Optica Sinica, 2016, 36(1): 105003

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: Diffraction and Gratings

    Received: Jul. 16, 2015

    Accepted: --

    Published Online: Dec. 31, 2015

    The Author Email: Si Xinchun (xyxido@hotmail.com)

    DOI:10.3788/aos201636.0105003

    Topics