Chinese Optics Letters, Volume. 14, Issue 9, 090501(2016)
Near-field holography enhanced with antireflection coatings—an improved method for fabricating diffraction gratings
Yuanfang Li1 , Huoyao Chen1 , Stefanie Kroker2,3,4 , Thomas Käsebier2 , Zhengkun Liu1 , Keqiang Qiu1 , Ying Liu1、* , Ernst-Bernhard Kley2 , Xiangdong Xu1 , Yilin Hong1 , and Shaojun Fu1
Author Affiliations
1 National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China2 Institut für Angewandte Physik, Friedrich-Schiller-Universität Jena, Max-Wien-Platz 1, Jena 07743, Germany3 Technische Universität Braunschweig, Laboratory for Emerging Nanometrology, Pockelsstr. 14, Braunschweig 38106, Germany4 Physikalisch-Technische Bundesanstalt, Bundesallee 100, Braunschweig 38116, Germanyshow less
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Yuanfang Li, Huoyao Chen, Stefanie Kroker, Thomas Käsebier, Zhengkun Liu, Keqiang Qiu, Ying Liu, Ernst-Bernhard Kley, Xiangdong Xu, Yilin Hong, Shaojun Fu, "Near-field holography enhanced with antireflection coatings—an improved method for fabricating diffraction gratings," Chin. Opt. Lett. 14, 090501 (2016)
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