Chinese Optics Letters, Volume. 14, Issue 9, 090501(2016)
Near-field holography enhanced with antireflection coatings—an improved method for fabricating diffraction gratings
Fig. 1. Principles for fabricating a grating with a constant line spacing by NFH. (a) Layout I. (b) Layout II.
Fig. 2. Sketch of interface reflections and their suppressions with ARCs during NFH. (a) Setup without ARCs. (b) Setup with ARC_ M and ARC_R.
Fig. 3. Simulated reflectance of the substrate to be patterned as a function of the thickness of the resist and of the ARC_R at a wavelength of 441.6 nm and an incidence angle of 32°.
Fig. 5. Comparison of the far field diffraction spots of the resist grating after NFH. (a) Layout I without the suppression of interface reflections, (b) Layout I with ARCs, and (c) Layout II with the refractive index liquid.
Fig. 6. Measured efficiency at the
Fig. 7. Diffraction efficiency angular spectrum of the gold-coated laminar grating samples at an incidence angle of 76.78° and a wavelength of 13 nm. The fabrication differences of the samples are indicated by the legend.
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Yuanfang Li, Huoyao Chen, Stefanie Kroker, Thomas Käsebier, Zhengkun Liu, Keqiang Qiu, Ying Liu, Ernst-Bernhard Kley, Xiangdong Xu, Yilin Hong, Shaojun Fu, "Near-field holography enhanced with antireflection coatings—an improved method for fabricating diffraction gratings," Chin. Opt. Lett. 14, 090501 (2016)
Category: Diffraction and Gratings
Received: Apr. 20, 2016
Accepted: Jul. 8, 2016
Published Online: Aug. 3, 2018
The Author Email: Ying Liu (liuychch@ustc.edu.cn)