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Chinese Optics Letters, Volume. 14, Issue 9, 090501(2016)

Near-field holography enhanced with antireflection coatings—an improved method for fabricating diffraction gratings

Yuanfang Li1, Huoyao Chen1, Stefanie Kroker2,3,4, Thomas Käsebier2, Zhengkun Liu1, Keqiang Qiu1, Ying Liu1、*, Ernst-Bernhard Kley2, Xiangdong Xu1, Yilin Hong1, and Shaojun Fu1
Author Affiliations
  • 1National Synchrotron Radiation Laboratory, University of Science and Technology of China, Hefei 230029, China
  • 2Institut für Angewandte Physik, Friedrich-Schiller-Universität Jena, Max-Wien-Platz 1, Jena 07743, Germany
  • 3Technische Universität Braunschweig, Laboratory for Emerging Nanometrology, Pockelsstr. 14, Braunschweig 38106, Germany
  • 4Physikalisch-Technische Bundesanstalt, Bundesallee 100, Braunschweig 38116, Germany
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    The article is cited by 8 article(s) from Web of Science.
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    Yuanfang Li, Huoyao Chen, Stefanie Kroker, Thomas Käsebier, Zhengkun Liu, Keqiang Qiu, Ying Liu, Ernst-Bernhard Kley, Xiangdong Xu, Yilin Hong, Shaojun Fu, "Near-field holography enhanced with antireflection coatings—an improved method for fabricating diffraction gratings," Chin. Opt. Lett. 14, 090501 (2016)

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    Paper Information

    Category: Diffraction and Gratings

    Received: Apr. 20, 2016

    Accepted: Jul. 8, 2016

    Published Online: Aug. 3, 2018

    The Author Email: Ying Liu (liuychch@ustc.edu.cn)

    DOI:10.3788/COL201614.090501

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology