Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces

Shanshan Mao; Yanqiu Li; Jiahua Jiang; Shihuan Shen; Ke Liu; Meng Zheng

doi:10.3788/COL201816.030801

Chinese Optics Letters, Volume. 16, Issue 3, 030801(2018)

Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces

Shanshan Mao, Yanqiu Li^*, Jiahua Jiang, Shihuan Shen, Ke Liu, and Meng Zheng

Key Laboratory of Photoelectron Imaging Technology and System of the Ministry of Education, School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China

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References(17)

[1] H. Shang, W. Huang, C. Liu, W. Xu, W. Yang. Chin. Opt. Lett., 11, 090802(2013).

[2] Y. Uehara, J. Ishikawa, H. Kohno, E. Tanaka, M. O. Ohba, Y. Shibazaki. Proc. SPIE, 8326, 83261H(2012).

[3] Z. Cao, Y. Li, S. Mao. Opt. Eng., 56, 025102(2017).

[4] D. G. Flagello, S. P. Renwick. Proc. SPIE, 9426, 942604(2015).

[5] K. P. Thompson, J. P. Rolland. Opt. Photon. News, 23, 30(2012).

[6] Y. Liu, Y. Li, Z. Cao. Appl. Opt., 55, 4917(2016).

[7] D. Cheng, Y. Wang, H. Hua, M. M. Talha. Appl. Opt., 48, 2655(2009).

[8] F. Duerr, Y. Meuret, H. Thienpont. Opt. Express, 21, 31072(2013).

[9] T. Yang, G. Jin, J. Zhu. Chin. Opt. Lett., 15, 062202(2017).

[10] H. J. Mann. Projection optics for microlithography. U.S. Patent(2014).

[11] J. M. Sasian, M. R. Descour. Opt. Eng., 37, 1001(1998).

[12] X. Cheng, Y. Wang, Q. Hao, J. Sasian. Appl. Opt., 42, 1309(2003).

[13] S. Weichselbaum, F. Bornebroek, T. Kort, R. Droste, R. Graaf, R. Ballegoij, H. Botter, M. G. Mclaren, W. P. Boeij. Proc. SPIE, 9426, 942616(2015).

[14] D. Shafer, W. Ulrich, A. Dodoc, R. V. Buenau, H. J. Mann, A. Epple. Catadioptric projection objective. U.S. Patent(2011).

[15] O. Marinescu, F. Bociort. Opt. Eng., 47, 093002(2008).

[16] H. Jasper, T. Modderman, M. Kerhof, C. Wagner, J. Mulkens, W. Boeij, E. Setten, B. Kneer. Proc. SPIE, 6154, 61541W(2006).

[17] C. Supranowitz, P. Dumas, T. Nitzsche, J. D. Nelson, B. Light, K. Medicus, N. Smith. Proc. SPIE, 8884, 888411(2013).

CLP Journals

[1] Yuting Deng, Guofan Jin, Jun Zhu, "Design method for freeform reflective-imaging systems with low surface-figure-error sensitivity," Chin. Opt. Lett. 17, 092201 (2019)

[2] Jianhui Li, Yanqiu Li, Ke Liu, Guodong Zhou, Lihui Liu, Meng Zheng, "Hybrid calibration method of a wide-view-angle Mueller polarimeter for hyper-numerical-aperture imaging systems," Chin. Opt. Lett. 18, 081202 (2020)

[3] Fang Wang, Xuewei Deng, Liquan Wang, Fuquan Li, Wei Han, Wei Zhou, Xiaoxia Huang, Huaiwen Guo, Qihua Zhu, "Efficient fifth harmonic generation of Nd:glass laser in ADP crystals," Chin. Opt. Lett. 17, 121403 (2019)

Cited By

[1] Tie Li, Yang Liu, Yiyu Sun, Enze Li, Pengzhi Wei, Yanqiu Li. Multiple-field-point pupil wavefront optimization in computational lithography. Applied Optics, 58, 8331(2019).

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Shanshan Mao, Yanqiu Li, Jiahua Jiang, Shihuan Shen, Ke Liu, Meng Zheng, "Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces," Chin. Opt. Lett. 16, 030801 (2018)

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Paper Information

Category: Geometric Optics

Received: Oct. 16, 2017

Accepted: Dec. 22, 2017

Published Online: Jul. 13, 2018

The Author Email: Yanqiu Li (liyanqiu@bit.edu.cn)

DOI:10.3788/COL201816.030801

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology