Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces

Shanshan Mao; Yanqiu Li; Jiahua Jiang; Shihuan Shen; Ke Liu; Meng Zheng

doi:10.3788/COL201816.030801

Chinese Optics Letters, Volume. 16, Issue 3, 030801(2018)

Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces

Shanshan Mao, Yanqiu Li^*, Jiahua Jiang, Shihuan Shen, Ke Liu, and Meng Zheng

Key Laboratory of Photoelectron Imaging Technology and System of the Ministry of Education, School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China

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Figures & Tables(13)

Fig. 1. Layout of the initial aspheric PO. The red dots represent aspheric surfaces.

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Fig. 2. Lens-form parameters of a single element in aspheric PO: (a) |Δwj| value of a single element and (b) |Δsj| value of a single element.

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Fig. 3. Aspheric PO structure after removing one element.

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Fig. 4. Aspheric PO structure after removing two elements.

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Fig. 5. (a) Aspheric PO sampled fields and (b) footprint map.

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Fig. 6. FFSs PO sampled fields.

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Fig. 7. PO structure with four FFSs.

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Fig. 8. Modulation transfer function plot.

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Fig. 9. FFSs PO footprint map.

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Fig. 10. (a) Wavefront RMS error and (b) distortion in the full image field.

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Fig. 11. Local curvature of FFSs in the X and Y directions. Only the used area of each surface is shown. (a) S16; (b) S21; (c) S22; (d) S33.

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Table 1. Lens-form Parameter Values of Aspheric Surfaces

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Table 1. Lens-form Parameter Values of Aspheric Surfaces

Surface No.	$w_{j}$	Surface No.	$s_{j}$
S30	0.3071	S30	0.9891
S20	0.2472	S20	0.9363
S19	0.1918	S1	0.5773
S15	0.1334	S15	0.4754
S23	0.1301	S17	0.3222
S38	0.0519	S41	0.3073
S17	0.0485	S19	0.2142
S1	0.0372	S4	0.2090
S6	0.0312	S23	0.1843
S4	0.0162	S6	0.1601
S41	0.0161	S31	0.1447
S33	0.0149	S38	0.1168
S31	0.0050	S33	0.0618

Table 2. Optical Characteristics of ASPSs and FFSs POs

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Table 2. Optical Characteristics of ASPSs and FFSs POs

Item	ASPSs PO	FFSs PO
Numerical aperture	1.2	1.2
Wavelength	193 nm	193 nm
Image-side field of view	$26 mm \times 5.5 mm$	$26 mm \times 5.5 mm$
Magnification	0.25	0.25
Front working distance	33 mm	33 mm
Total track length	1253 mm	1232 mm
Number of aspheric surfaces	13	9
Number of freeform surfaces		4
Number of lenses	25	23
Thickness of all lenses	659 mm	631 mm
Telecentricity	$< 6 mrad$	$< 6 mrad$
Max. aspheric departure	$< 1.7 mm$	$< 1.35 mm$
Wavefront RMS error	$< 0.006 λ$	$< 0.005 λ$
Distortion	$< 1 nm$	$< 0.5 nm$

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Shanshan Mao, Yanqiu Li, Jiahua Jiang, Shihuan Shen, Ke Liu, Meng Zheng, "Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces," Chin. Opt. Lett. 16, 030801 (2018)

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Paper Information

Category: Geometric Optics

Received: Oct. 16, 2017

Accepted: Dec. 22, 2017

Published Online: Jul. 13, 2018

The Author Email: Yanqiu Li (liyanqiu@bit.edu.cn)

DOI:10.3788/COL201816.030801

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology