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Chinese Optics Letters, Volume. 16, Issue 3, 030801(2018)

Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces

Shanshan Mao, Yanqiu Li*, Jiahua Jiang, Shihuan Shen, Ke Liu, and Meng Zheng
Author Affiliations
  • Key Laboratory of Photoelectron Imaging Technology and System of the Ministry of Education, School of Optics and Photonics, Beijing Institute of Technology, Beijing 100081, China
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    Citation counts are provided from Web of Science. The counts may vary by service, and are reliant on the availability of their data.
    The article is cited by 12 article(s) from Web of Science.
    The article is cited by 3 article(s) CLP online library. (Some content might be in Chinese.)
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    Shanshan Mao, Yanqiu Li, Jiahua Jiang, Shihuan Shen, Ke Liu, Meng Zheng, "Design of a hyper-numerical-aperture deep ultraviolet lithography objective with freeform surfaces," Chin. Opt. Lett. 16, 030801 (2018)

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    Paper Information

    Category: Geometric Optics

    Received: Oct. 16, 2017

    Accepted: Dec. 22, 2017

    Published Online: Jul. 13, 2018

    The Author Email: Yanqiu Li (liyanqiu@bit.edu.cn)

    DOI:10.3788/COL201816.030801

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology