[1] [1] Semiconductor Industry Association. International Technology Roadmap for Semiconductor[M]. Sematech, 1999.

[2] [2] T Fuehner, A Erdmann, T Schnattinger. Genetic algorithms for geometry optimization in lithographic imaging systems[C]. SPIE, 2004, 5558: 29-40.

[3] [3] Chaoxing Yang, Xiangzhao Wang, Sikun Li, et al.. Source mask optimization using real-coded genetic algorithms[C]. SPIE, 2013, 8683: 86831T.

[4] [4] Chaoxing Yang, Sikun Li, Xiangzhao Wang. Efficient source mask optimization using multipole source representation[J]. J Micro/Nanolith MEMS MOEMS, 2014, 13(4): 043001.

[5] [5] Cai Yanmin, Wang Xiangzhao, Bu Yang, et al.. Optical design of Fourier transform lens for measurement of illumination pupil of lithography tools[J]. Chinese J Lasers, 2015, 42(4): 0416001.

[6] [6] Wu Feibin, Tang Feng, Wang Xiangzhao, et al.. Study on Ronchi shearing interferometry for wave-front aberration measurement of lithography projection lens[J]. Chinese J Lasers, 2015, 42(3): 0308008.

[7] [7] Li Zhaoze, Li Sikun, Wang Xiangzhao. Source and mask optimization using stochastic parallel gradient descent algorithm in optical lithography[J]. Acta Optica Sinica, 2014, 34(9): 0911002.

[8] [8] Yao Peng, Jinyu Zhang, Yan Wang, et al.. Gradient-based source and mask optimization in optical lithography [J]. IEEE Transactions on Image Processing, 2011, 20(10): 2856-2864.

[9] [9] T Hashimoto, Y Kai, K Masukawa, et al.. Robust SMO methodology for exposure tool and mask variations in high volume production[C]. SPIE, 2013, 8683: 868309.

[10] [10] Sikun Li, Xiangzhao Wang, Yang Bu. Robust pixel-based source and mask optimization for inverse lithography[J]. Optics & Laser Technology, 2012, 45: 285-293.

[11] [11] Yijiang Shen, Ningning Jia, Ngai Wong, et al.. Robust level-set-based inverse lithography[J]. Opt Express, 2011, 19(6) : 5511-5521.

[12] [12] T Fuhner, P Evanschitzky, A Erdmann. Mutual source, mask, and projector pupil optimization[C]. SPIE, 2012, 8326: 83260I.

[13] [13] Guo Liping, Huang Huijie, Wang Xiangzhao. Off-axis illumination for optical lithography[J]. Laser Journal, 2005, 26(1)：23-25.

[14] [14] J H Chang, C C Chen, L S Melvin III. Hierarchical kernel generation for SMO application[C]. SPIE, 2011, 7973: 797323.

[15] [15] A K K Wong. Optical imaging in projection microlithography[C]. SPIE, 2005.