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Chinese Journal of Lasers, Volume. 45, Issue 11, 1100001(2018)

13.5 nm Extreme Ultraviolet Light Source Based on Discharge Produced Xe Plasma

Yongpeng Zhao1、*, Qiang Xu1,2, Qi Li1, and Qi Wang1
Author Affiliations
  • 1 National Key Laboratory of Science and Technology on Tunable Laser, Harbin Institute of Technology, Harbin, Heilongjiang 150080, China
  • 2 College of Science, Northeast Forestry University, Harbin, Heilongjiang 150040, China
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    Yongpeng Zhao, Qiang Xu, Qi Li, Qi Wang. 13.5 nm Extreme Ultraviolet Light Source Based on Discharge Produced Xe Plasma[J]. Chinese Journal of Lasers, 2018, 45(11): 1100001

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    Paper Information

    Category: reviews

    Received: May. 28, 2018

    Accepted: Jul. 5, 2018

    Published Online: May. 9, 2019

    The Author Email:

    DOI:10.3788/CJL201845.1100001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology