Chinese Journal of Lasers, Volume. 45, Issue 11, 1100001(2018)

13.5 nm Extreme Ultraviolet Light Source Based on Discharge Produced Xe Plasma

Yongpeng Zhao1、*, Qiang Xu1,2, Qi Li1, and Qi Wang1
Author Affiliations
  • 1 National Key Laboratory of Science and Technology on Tunable Laser, Harbin Institute of Technology, Harbin, Heilongjiang 150080, China
  • 2 College of Science, Northeast Forestry University, Harbin, Heilongjiang 150040, China
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    Figures & Tables(20)
    Structural diagram of experimental setup of EUV light source based on discharge produced Xe plasma
    Circuit diagram of main pulse power supply
    Typical voltage and current waveforms of main pulse
    EUV spectra emitted from Xe and He plasma
    Current waveform of main pulse and 13.5 nm radiation versus time
    13.5 nm radiation and plasma radius versus time
    13.5 nm radiation intensity versus current of main pulse
    13.5 nm radiation intensity versus Xe flow rate
    EUV spectra emitted from Xe plasma under different ceramic tube diameters
    EUV spectra emitted from Xe plasma with different plasma lengths
    EUV spectra emitted from plasma under different He/Xe flow rate ratios
    13.5 nm radiation intensity versus He/Xe flow rate ratio
    EUV spectra emitted from plasma under Xe/Ar mixed gas and pure Xe conditions
    Structural diagram of EUV light source prototype based on discharge produced Xe plasma
    Picture of debris mitigation tool of multilayer metal foil
    Diagram of optical path for 10 layer collector system
    Picture of collector after finish turning and polishing by hand
    Picture of EUV light source prototype based on discharge produced Xe plasma at repetition frequency of 1 kHz
    EUV spectrum emitted from discharge produced Xe plasma
    13.5 nm radiation light pulse and current waveform of main pulse
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    Yongpeng Zhao, Qiang Xu, Qi Li, Qi Wang. 13.5 nm Extreme Ultraviolet Light Source Based on Discharge Produced Xe Plasma[J]. Chinese Journal of Lasers, 2018, 45(11): 1100001

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    Paper Information

    Category: reviews

    Received: May. 28, 2018

    Accepted: Jul. 5, 2018

    Published Online: May. 9, 2019

    The Author Email:

    DOI:10.3788/CJL201845.1100001

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