Chinese Journal of Lasers, Volume. 45, Issue 11, 1100001(2018)
13.5 nm Extreme Ultraviolet Light Source Based on Discharge Produced Xe Plasma
Fig. 1. Structural diagram of experimental setup of EUV light source based on discharge produced Xe plasma
Fig. 9. EUV spectra emitted from Xe plasma under different ceramic tube diameters
Fig. 13. EUV spectra emitted from plasma under Xe/Ar mixed gas and pure Xe conditions
Fig. 14. Structural diagram of EUV light source prototype based on discharge produced Xe plasma
Fig. 18. Picture of EUV light source prototype based on discharge produced Xe plasma at repetition frequency of 1 kHz
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Yongpeng Zhao, Qiang Xu, Qi Li, Qi Wang. 13.5 nm Extreme Ultraviolet Light Source Based on Discharge Produced Xe Plasma[J]. Chinese Journal of Lasers, 2018, 45(11): 1100001
Category: reviews
Received: May. 28, 2018
Accepted: Jul. 5, 2018
Published Online: May. 9, 2019
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