Journals Articles Conferences News About CLP
Submit a paper Email Alert
Search
Search
Articles
Journals
News
Advanced Search
Top Searches
2D MaterialsTransformation opticsQuantum PhotonicsSmall lasersSemiconductor UV PhotonicsSupersymmetric microring laser arrays

Chinese Journal of Lasers, Volume. 45, Issue 11, 1100001(2018)

13.5 nm Extreme Ultraviolet Light Source Based on Discharge Produced Xe Plasma

Yongpeng Zhao1、*, Qiang Xu1,2, Qi Li1, and Qi Wang1
Author Affiliations
  • 1 National Key Laboratory of Science and Technology on Tunable Laser, Harbin Institute of Technology, Harbin, Heilongjiang 150080, China
  • 2 College of Science, Northeast Forestry University, Harbin, Heilongjiang 150040, China
    • show less
    AbstractGet PDF(in Chinese)
    Figures&Tables (20)
    Equations (0)
    References (0)
    Cited By (4)
    Tools
    Paper Information
    Topics
    Cited By

    Article index updated: Mar. 10, 2025

    The article is cited by 4 article(s) CLP online library. (Some content might be in Chinese.)
    Tools

    Get Citation

    Copy Citation Text

    Yongpeng Zhao, Qiang Xu, Qi Li, Qi Wang. 13.5 nm Extreme Ultraviolet Light Source Based on Discharge Produced Xe Plasma[J]. Chinese Journal of Lasers, 2018, 45(11): 1100001

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Set citation alerts for article
    Save article for my favorites
    Paper Information

    Category: reviews

    Received: May. 28, 2018

    Accepted: Jul. 5, 2018

    Published Online: May. 9, 2019

    The Author Email:

    DOI:10.3788/CJL201845.1100001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology