Fig. 1. Optical principle diagram of projection lithography machine

Fig. 2. Schematics of pupil ellipticity. (a) HV pupil ellipticity; (b) ST pupil ellipticity

Fig. 3. Schematics of pupil non-balance. (a) Non-balance_X; (b) non-balance_Y

Fig. 4. Schematics of non-balance_quad.(a) Non-balance_quad0; (b) non-balance_quad45

Fig. 5. Schematic of pupil data partition

Fig. 6. Schematic of nearest interpolation method

Fig. 7. Flow chart of evaluation algorithm

Fig. 8. Structural diagram of relay lens set in illumination system for 28 nm node scanning lithography machine

Fig. 9. Spectra of multilayer film under different incident angles. (a) 0°- 20°, anti-reflection film; (b) 0°-30°, anti-reflection film; (c) 0°-50°, anti-reflection film; (d) 35°-55°, reflection film

Fig. 10. Distribution schematic of sampling field of view points in lighting area

Fig. 11. Pupil maps of view points. (a) F1; (b) F2; (c)F3; (d) F4; (e) F5; (f) F6; (g) F7; (h) F8; (i) F9

Fig. 12. Curves of pupil characteristic parameters of view points at X direction