Evaluation Algorithm of Pupil Characteristic Parameters in Lithography Illumination System

Yu Gan; Fang Zhang; Siyu Zhu; Shuang Gong; Huijie Huang; Baoxi Yang

doi:10.3788/CJL201946.0304007

Chinese Journal of Lasers, Volume. 46, Issue 3, 0304007(2019)

Evaluation Algorithm of Pupil Characteristic Parameters in Lithography Illumination System

Yu Gan^1,2、*, Fang Zhang^1,2, Siyu Zhu^1,2, Shuang Gong^1,2, Huijie Huang^1,2, and Baoxi Yang^1,2、*

¹ Laboratory of Information Optics and Opto-Electronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

² University of Chinese Academy of Sciences, Beijing 100049, China

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Yu Gan, Fang Zhang, Siyu Zhu, Shuang Gong, Huijie Huang, Baoxi Yang. Evaluation Algorithm of Pupil Characteristic Parameters in Lithography Illumination System[J]. Chinese Journal of Lasers, 2019, 46(3): 0304007

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Paper Information

Category: measurement and metrology

Received: Oct. 30, 2018

Accepted: Dec. 18, 2018

Published Online: May. 9, 2019

The Author Email:

DOI:10.3788/CJL201946.0304007

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology