Fig. 1. EUV reflectivity curves of Mg/SiC multilayer with different background vacuum^[50]

Fig. 2. TEM images and XPS test results of Mg/SiC multilayer^[51]. (a) Bright field image; (b) high resolution image; (c) dark field image (inset is selected area electron diffraction); (d) element content depth distribution in XPS depth analysis

Fig. 3. EUV reflectivity curves of Mg/SiC multilayer introducing Zr barrier layers with different thicknesses^[52]

Fig. 4. GIXR reflectivity and decay of the first Bragg peak intensity over time after plating of Al-Mg mixing layer at different time intervals^[55]. (a) GIXR reflectivity; (b) decay of the first Bragg peak intensity over time

Fig. 5. Theoretical EUV reflectivity curves of Sc/Si multilayers with γ_Sc=0.37 and γ_Sc=0.67

Fig. 6. High resolution TEM bright field images of Sc/Si multilayers. (a) γ_Sc=0.40; (b) γ_Sc=0.65

Fig. 7. EUV reflectivity curve of Sc/Si multilayer with γ_Sc=0.65

Fig. 8. Theoretical reflectivity curves of Yb/Al multilayer in VUV wavelength range. (a) Theoretical reflectivity curve without SiC surface layers; (b) theoretical reflectivity curves when introducing SiC surface layers of different thicknesses

Fig. 9. Theoretical and measured reflectivity curves of Yb/Al multilayer prepared under 4×10^-5 Pa background vacuum at 73.59 nm wavelength of Ne I

Fig. 10. Reflectivity curves of Al+eMgF₂ mirrors prepared at different substrate temperature T

Fig. 11. Reflectivity curves of Al+eLiF mirror prepared at different substrate temperatures

Fig. 12. Reflectivity curves of Al+LiF+eMgF₂ mirrors in 105--130 nm wavelength range

Fig. 13. Reflectivity curves of LaF₃/MgF₂ film in 105--130 nm wavelength range