Fig. 1. Schematic diagram of complete manufacturing technology for DOE with complex structures

Fig. 2. High-precision microlithography data processing for complex structures

Fig. 3. Experimental results of sub-10 nm lithography and generation of complex pattern

Fig. 4. Schematic illustration of pattern transfer by additive（a，b） and subtractive（c，d） manufacturing techniques

Fig. 5. Six inch phase-type DUV transmission DOE.（a）Fabricated DOE；（b）Optical structures at central location； （c-e） Optical structures at various edge locations；（f） Position accuracy；（g）Surface flatness

Fig. 6. Six inch amplitude-type EUV reflective DOE.（a）Fabricated DOE；（b）Surface SEM image of Cr film； （c） AFM characterization exhibiting surface roughness at three different locations； （d） Reflectivity verus wavelength plot for Mo/Si multilayer； （e-f） Surface and cross-sectional SEM images of the fabricated DOE

Fig. 7. Four inch soft X-ray transmission DOE fabricated by free-standing gold transmission grating supported by Au grid structures

Fig. 8. Hard X-ray reflective DOE.（a）the fabricated DOE；（b-c） SEM images of gold strip gratings；（d）AFM characterization； （e） Surface flatness of the fabricated DOE