[1] [1] 1金国藩，二元光学［M］. 北京： 国防工业出版社， 1998. doi: 10.12173/j.issn.1004-5511.202111004JING F. Binary Optics［M］. Beijing： National Defense Industry Press， 1998.（in Chinese）. doi: 10.12173/j.issn.1004-5511.202111004

[2] LOHMANN A W. A pre-history of computer-generated holography[J]. Optics and Photonics News, 19, 36-47(2008).

[3] REINHARD V. Diffractive optics[J]. Advanced Optical Technologies, 10, 17-18(2021).

[4] LEGER J, HOLZ M, SWANSON G. Coherent laser beam addition- An application of binary-optics technology[report](1988).

[5] [5] 5刘帅， 刘春雨，王天聪. 星载空间目标监视折衍射光学成像系统设计［J］.光学精密工程， 2017， 25（12z）： 24-31. doi: 10.1117/12.2285166LIUSH， LIUCH Y， WANGT C. Refractive-diffractive optical imaging system for satellite-borne surveillance of space targets ［J］. Optics and Precision Engineering， 2017，25（12z）： 24-31. （in Chinese）. doi: 10.1117/12.2285166

[6] [6] 6张健， 栗孟娟， 阴刚华， 等. 用于太空望远镜的大口径薄膜菲涅尔衍射元件［J］. 光学 精密工程， 2016， 24（6）： 1289-1296. doi: 10.3788/ope.20162406.1289ZHANGJ， LIM J， YING H， et al. Large-diameter membrane Fresnel diffraction elements for space telescope［J］. Optics and Precision Engineering， 2016， 24（6）： 1289-1296.（in Chinese）. doi: 10.3788/ope.20162406.1289

[7] [7] 7陈宜方. X射线衍射光学部件的制备及其光学性能表征［J］. 光学 精密工程， 2017， 25（11）： 2779-2795. doi: 10.3788/ope.20172511.2779CHENY F. Fabrication of diffractive X-ray optics and their performance characterization［J］. Optics and Precision Engineering， 2017， 25（11）： 2779-2795.（in Chinese）. doi: 10.3788/ope.20172511.2779

[8] ZHANG F, ZHU J, YUE W R et al. An approach to increase efficiency of DOE based pupil shaping technique for off-axis illumination in optical lithography[J]. Optics Express, 23, 4482-4493(2015).

[9] LEONARD J, CARRIERE J, STACK J et al. An improved process for manufacturing diffractive optical elements （DOEs） for off-axis illumination systems[J]. SPIE, 6924(2008).

[10] GROSSINGER I, KEDMI J. Diffractive optical element for extreme ultraviolet wavefront control[P].

[11] WAIBLINGER M, KORNILOV K, HOFMANN T et al. E-beam induced EUV photomask repair： a perfect match[C], 7545(2010).

[12] [12] 12周常河. 微纳光学结构及应用［J］. 激光与光电子学进展， 2009， 46（10）： 22-27. doi: 10.3788/lop20094610.0022ZHOUCH H. Micro- & nano- optical structures and applications［J］. Laser ＆ Optoelectronics Progress， 2009， 46（10）： 22-27.（in Chinese）. doi: 10.3788/lop20094610.0022

[13] VAN SCHOOT J, VAN SETTEN E, TROOST K et al. High-NA EUV lithography exposure tool： program progress[C], 11323, 1132307(2020).

[14] [EB/OL]. International Roadmap for Devices and Systems ［Z/OL］. https：//irds.ieee.org/

[15] VELDKAMP W B. Binary optics and beyond： where do we go from here？[J]. Japanese Journal of Applied Physics, 45, 6550-6554(2006).

[16] MANFRINATO V R, ZHANG L H, SU D et al. Resolution limits of electron-beam lithography toward the atomic scale[J]. Nano Letters, 13, 1555-1558(2013).

[17] CHAO W L, KIM J, REKAWA S et al. Demonstration of 12 nm resolution Fresnel zone plate lens based soft X-ray microscopy[J]. Optics Express, 17, 17669-17677(2009).

[18] KAZANSKIY N L, SKIDANOV R V. Technological line for creation and research of diffractive optical elements[C], 11146, 11460W(2019).

[19] CHANG C, SAKDINAWAT A. Ultra-high aspect ratio high-resolution nanofabrication for hard X-ray diffractive optics[J]. Nature Communications, 5, 4243(2014).

[20] AKAN R, FRISK T, LUNDBERG F et al. Metal-assisted chemical etching and electroless deposition for fabrication of hard X-ray Pd/Si zone plates[J]. Micromachines, 11, 301(2020).

[21] ZHU J Y, CHEN Y F, XIE S S et al. Nanofabrication of 30 nm Au zone plates by e-beam lithography and pulse voltage electroplating for soft X-ray imaging[J]. Microelectronic Engineering, 225, 111254(2020).

[22] LI Z Q, CHEN Y Q, ZHU X P et al. Fabrication of single-crystal silicon nanotubes with sub-10 nm walls using cryogenic inductively coupled plasma reactive ion etching[J]. Nanotechnology, 27, 365302(2016).

[23] LIU Q, ZHAO J, GUO J L et al. Sub-5 nm lithography with single GeV heavy ions using inorganic resist[J]. Nano Letters, 21, 2390-2396(2021).

[24] [24] 24刘容. 中国科学院微电子中心开发出0.8微米集成电路［J］. 高技术通讯， 1995， 5（8）： 62， 54. doi: 10.3321/j.issn:1002-0470.1995.08.021LIUR. The microelectronics centre of CAS developed the technique of fabricating of 0.8 μm integration circuits［J］. High Technology Letters， 1995， 5（8）： 62， 54.（in Chinese）. doi: 10.3321/j.issn:1002-0470.1995.08.021

[25] [25] 25谢常青， 叶甜春， 孙宝银， 等. 0.5μm分辨率同步辐射X射线光刻技术［J］. 微细加工技术， 1999（3）： 32-34， 5.XIECH Q， YET CH， SUNB Y， et al. Synchrotron radiation X ray lithography technique for 0.5μm resolution［J］. Microfabrication Technology， 1999（3）： 32-34， 5.（in Chinese）

[26] [26] 26谢常青， 朱效立， 牛洁斌， 等. 微纳金属光学结构制备技术及应用［J］. 光学学报， 2011， 31（9）： 0900128. doi: 10.3788/aos201131.0900128XIECH Q， ZHUX L， NIUJ B， et al. Micro-and nano-metal structures fabrication technology and applications［J］. Acta Optica Sinica， 2011， 31（9）： 0900128.（in Chinese）. doi: 10.3788/aos201131.0900128

[27] XIE C Q, ZHU X L, LI H L et al. Hybrid lithography for X-ray diffractive optical elements[J]. SPIE Newsroom, 1075(2014).

[28] DI FABRIZIO E, CABRINI S, COJOC D et al. Shaping X-rays by diffractive coded nano-optics[J]. Microelectronic Engineering, 67/68, 87-95(2003).

[29] SHE A L, ZHANG S Y, SHIAN S et al. Large area metalenses： design， characterization， and mass manufacturing[J]. Optics Express, 26, 1573-1585(2018).

[30] LI H L, YE T C, SHI L N et al. Fabrication of ultra-high aspect ratio （>160∶1） silicon nanostructures by using Au metal assisted chemical etching[J]. Journal of Micromechanics and Microengineering, 27, 124002(2017).

[31] LI H L, XIE C Q. Fabrication of ultra-high aspect ratio （>420∶1） Al₂O₃ nanotube arraysby sidewall TransferMetal assistant chemical etching[J]. Micromachines, 11, 378(2020).

[32] [32] 32杜宇禅， 李海亮， 史丽娜， 等. 32nm节点极紫外光刻掩模的集成研制［J］. 光学学报， 2013， 33（10）： 327-333. doi: 10.3788/aos201333.1034002DUY CH， LIH L， SHIL N， et al. Integrated development of extreme ultraviolet lithography mask at 32nm node［J］. Acta Optica Sinica， 2013， 33（10）： 327-333.（in Chinese）. doi: 10.3788/aos201333.1034002

[33] LOUIS E, YAKSHIN AE, GÖRTS P C et al. Progress in Mo/Si multilayer coating technology for EUVL optics[J]. SPIE, 3997, 406-411(2000).

[34] LIU Y, XIE C Q. Large-area SiC membrane produced by plasma enhanced chemical vapor deposition at relatively high temperature[J]. Journal of Vacuum Science & Technology A： Vacuum， Surfaces， and Films, 33(2015).

[35] XIE C Q, ZHU X L, LI H L et al. Fabrication of X-ray diffractive optical elements for laser fusion applications[J]. Optical Engineering, 52(2013).

[36] WANG E L, NIU J B, LIANG Y H et al. Complete control of multichannel， angle‐multiplexed， and arbitrary spatially varying polarization fields[J]. Advanced Optical Materials, 8, 1901674(2020).

[37] QU F R, WANG G Y et al. A MEMS thermal shear stress sensor produced by a combination of substrate-free structures with anodic bonding technology[J]. Applied Physics Letters, 109(2016).

[38] HEILMANN R K, BRUCCOLERI A R, SONG J et al. Toward volume manufacturing of high-performance soft X-ray critical-angle transmission gratings[webpage]. 2020： arXiv, 2012-04607. https：//arxiv.org/abs/2012.04607