The key fabrication technology for diffractive optical elements （DOE） was systematically investigated from the following four aspects： graphic data processing， advanced lithography， pattern transfer， and large-area integration with high reliability. Based on the standard CMOS process， a complete set of manufacturing technologies for DOE with high precision， multi-functionality （high fidelity， high aspect ratio， high surface flatness， multiple substrates， etc.）， and large area was proposed. A data processing system with precision greater than 2 nm is developed for complex pattern lithography. Moreover， a hybrid lithography method was proposed and two types of basic pattern transfer techniques and four different processes are established， including additive processes （lift-off and electroplating） and subtractive processes （drying etching and low-temperature metal assisted chemical etching）. Importantly， we demonstrate the pattern generation from micron to sub-10 nm scale， pattern transfer of 25 nm gold structures with aspect ratio of 12∶1， and 30 nm Al₂O₃ nanotubes with aspect ratio up to 500∶1. Based on various substrates， including fused quartz， multilayer film， SiC self-supporting membrane， and wafer with high surface flatness， various large-area DOEs are integrated. The maximum area is 142 mm×142 mm， the maximum self-supporting aperture is 70 mm， and the highest surface flatness is 0.03λ peak to valley. Our proposed framework can meet the manufacturing requirements of various DOEs， covering the spectral bands ranging from visible light to hard X-rays. Various DOEs are used in four major optical projects， including advanced lithography， synchrotron radiation， laser fusion， and X-ray astronomy， as well as more than 1 000 domestic and foreign universities， scientific research institutes， and high-tech enterprises.