Overlay Error Measurement Method Based on Through-Focus Scanning Optical Microscopy

Hao Liu; Jinsong Wang; Junkai Shi; Guannan Li; Xiaomei Chen; Weihu Zhou

doi:10.3788/AOS231900

Acta Optica Sinica, Volume. 44, Issue 9, 0912004(2024)

Overlay Error Measurement Method Based on Through-Focus Scanning Optical Microscopy

Hao Liu¹, Jinsong Wang^1、*, Junkai Shi^2、**, Guannan Li², Xiaomei Chen², and Weihu Zhou²

Author Affiliations

¹School of Optoelectronic Engineering, Changchun University of Science and Technology, Changchun 130022, Jilin, China

²Optoelectronic Technology R&D Center, Institute of Microelectronics of the Chinese Academy of Sciences, Beijing 100029, China

show less

Abstract Get PDF(in Chinese)

Cited By

Article index updated: Sep. 6, 2025

The article is cited by 2 article(s) CLP online library. (Some content might be in Chinese.)

Tools

Get Citation

Copy Citation Text

Hao Liu, Jinsong Wang, Junkai Shi, Guannan Li, Xiaomei Chen, Weihu Zhou. Overlay Error Measurement Method Based on Through-Focus Scanning Optical Microscopy[J]. Acta Optica Sinica, 2024, 44(9): 0912004

Download Citation

EndNote(RIS)BibTex Plain Text

Set citation alerts for article

Save article for my favorites

Paper Information

Category: Instrumentation, Measurement and Metrology

Received: Dec. 7, 2023

Accepted: Feb. 26, 2024

Published Online: May. 15, 2024

The Author Email: Jinsong Wang (Soldier_1973@163.com), Junkai Shi (shijunkai@ime.ac.cn)

DOI:10.3788/AOS231900

CSTR:32393.14.AOS231900

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology