Acta Optica Sinica, Volume. 43, Issue 3, 0323002(2023)

One-Step Photolithographic Preparation Technology of Micron-Level Double-Layer Composite Structures

Dengying Zhang1,2,3,4、*, Linwei Zhu3, Weiren Li3, Honghu Gao3, Wenqiang Xing3, Xiaotong Jiang3, Jun Wang2, and Zheng Xu1,4、**
Author Affiliations
  • 1Institute of Optoelectronics Technology, Beijing Jiaotong University, Beijing 100044, China
  • 2Beijing Solar Power Research Institute Co., Ltd., Beijing 101102, China
  • 3School of Physics and Optoelectronic Engineering, Ludong University, Yantai 264025, Shandong, China
  • 4Key Laboratory of Luminescence and Optical Information, Ministry of Education, Beijing Jiaotong University, Beijing 100044, China
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    Dengying Zhang, Linwei Zhu, Weiren Li, Honghu Gao, Wenqiang Xing, Xiaotong Jiang, Jun Wang, Zheng Xu. One-Step Photolithographic Preparation Technology of Micron-Level Double-Layer Composite Structures[J]. Acta Optica Sinica, 2023, 43(3): 0323002

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    Paper Information

    Category: Optical Devices

    Received: Jul. 4, 2022

    Accepted: Aug. 12, 2022

    Published Online: Feb. 13, 2023

    The Author Email: Zhang Dengying (zhangdengying@ldu.edu.cn), Xu Zheng (zhengxu@bjtu.edu.cn)

    DOI:10.3788/AOS221414

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