One-Step Photolithographic Preparation Technology of Micron-Level Double-Layer Composite Structures

Dengying Zhang; Linwei Zhu; Weiren Li; Honghu Gao; Wenqiang Xing; Xiaotong Jiang; Jun Wang; Zheng Xu

doi:10.3788/AOS221414

Acta Optica Sinica, Volume. 43, Issue 3, 0323002(2023)

One-Step Photolithographic Preparation Technology of Micron-Level Double-Layer Composite Structures

Dengying Zhang^1,2,3,4、*, Linwei Zhu³, Weiren Li³, Honghu Gao³, Wenqiang Xing³, Xiaotong Jiang³, Jun Wang², and Zheng Xu^1,4、**

Author Affiliations

¹Institute of Optoelectronics Technology, Beijing Jiaotong University, Beijing 100044, China

²Beijing Solar Power Research Institute Co., Ltd., Beijing 101102, China

³School of Physics and Optoelectronic Engineering, Ludong University, Yantai 264025, Shandong, China

⁴Key Laboratory of Luminescence and Optical Information, Ministry of Education, Beijing Jiaotong University, Beijing 100044, China

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Dengying Zhang, Linwei Zhu, Weiren Li, Honghu Gao, Wenqiang Xing, Xiaotong Jiang, Jun Wang, Zheng Xu. One-Step Photolithographic Preparation Technology of Micron-Level Double-Layer Composite Structures[J]. Acta Optica Sinica, 2023, 43(3): 0323002

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Paper Information

Category: Optical Devices

Received: Jul. 4, 2022

Accepted: Aug. 12, 2022

Published Online: Feb. 13, 2023

The Author Email: Dengying Zhang (zhangdengying@ldu.edu.cn), Zheng Xu (zhengxu@bjtu.edu.cn)

DOI:10.3788/AOS221414

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology