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Acta Optica Sinica, Volume. 43, Issue 3, 0323002(2023)

One-Step Photolithographic Preparation Technology of Micron-Level Double-Layer Composite Structures

Dengying Zhang1,2,3,4、*, Linwei Zhu3, Weiren Li3, Honghu Gao3, Wenqiang Xing3, Xiaotong Jiang3, Jun Wang2, and Zheng Xu1,4、**
Author Affiliations
  • 1Institute of Optoelectronics Technology, Beijing Jiaotong University, Beijing 100044, China
  • 2Beijing Solar Power Research Institute Co., Ltd., Beijing 101102, China
  • 3School of Physics and Optoelectronic Engineering, Ludong University, Yantai 264025, Shandong, China
  • 4Key Laboratory of Luminescence and Optical Information, Ministry of Education, Beijing Jiaotong University, Beijing 100044, China
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    AbstractGet PDF(in Chinese)
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    Figures & Tables(6)
    Layout diagram of masks. (a) Mask 1; (b) mask 2

    Fig. 1. Layout diagram of masks. (a) Mask 1; (b) mask 2

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    Schematic diagram of photolithography process

    Fig. 2. Schematic diagram of photolithography process

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    Surface and cross-section images of single-concave-type double-layer composite structure sample under different exposure energies and development times. (a) Exposure energy of 128 mJ/cm2 and development time of 700 s; (b) exposure energy of 138 mJ/cm2 and development time of 700 s; (c) exposure energy of 240 mJ/cm2 and development time of 410 s

    Fig. 3. Surface and cross-section images of single-concave-type double-layer composite structure sample under different exposure energies and development times. (a) Exposure energy of 128 mJ/cm2 and development time of 700 s; (b) exposure energy of 138 mJ/cm2 and development time of 700 s; (c) exposure energy of 240 mJ/cm2 and development time of 410 s

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    Surface and cross-section images of double-concave-type double-layer composite structure sample under different exposure energies and identical development time. (a) Exposure energy of 125 mJ/cm2 and development time of 750 s; (b) exposure energy of 130 mJ/cm2 and development time of 750 s; (c) exposure energy of 160 mJ/cm2 and development time of 750 s

    Fig. 4. Surface and cross-section images of double-concave-type double-layer composite structure sample under different exposure energies and identical development time. (a) Exposure energy of 125 mJ/cm2 and development time of 750 s; (b) exposure energy of 130 mJ/cm2 and development time of 750 s; (c) exposure energy of 160 mJ/cm2 and development time of 750 s

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    Schematic diagram of yz plane of simulation model

    Fig. 5. Schematic diagram of yz plane of simulation model

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    Simulation results of light intensity distribution. (a) Overall distribution of light intensity on yz plane; (b) light intensity distribution curve at z=0; (c) light intensity distribution curve at z=4 μm; (d) light intensity distribution curve at z=8 μm

    Fig. 6. Simulation results of light intensity distribution. (a) Overall distribution of light intensity on yz plane; (b) light intensity distribution curve at z=0; (c) light intensity distribution curve at z=4 μm; (d) light intensity distribution curve at z=8 μm

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    Dengying Zhang, Linwei Zhu, Weiren Li, Honghu Gao, Wenqiang Xing, Xiaotong Jiang, Jun Wang, Zheng Xu. One-Step Photolithographic Preparation Technology of Micron-Level Double-Layer Composite Structures[J]. Acta Optica Sinica, 2023, 43(3): 0323002

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    Paper Information

    Category: Optical Devices

    Received: Jul. 4, 2022

    Accepted: Aug. 12, 2022

    Published Online: Feb. 13, 2023

    The Author Email: Zhang Dengying (zhangdengying@ldu.edu.cn), Xu Zheng (zhengxu@bjtu.edu.cn)

    DOI:10.3788/AOS221414

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology