Acta Optica Sinica, Volume. 44, Issue 13, 1334002(2024)

X-Ray Nano-Resolution Stereo Imaging and Its Application in Chip Characterization

Cong Liu1,2, Feixiang Wang2、*, Fen Tao2, Guohao Du2, Ling Zhang2, Jun Wang2, and Biao Deng2、**
Author Affiliations
  • 1School of Microelectronics, Shanghai University, Shanghai 200444, China
  • 2Shanghai Synchrotron Radiation Facility, Shanghai Advanced Research Institute, Chinese Academy of Sciences, Shanghai 201204, China
  • show less
    References(28)

    [1] Wang X Y, Jiang S X. Overview of chip defect detection[J]. Modern Manufacturing Technology and Equipment, 58, 94-98(2022).

    [8] Yuan Q X, Deng B, Guan Y et al. Novel developments and applications of nanoscale synchrotron radiation microscopy[J]. Physics, 48, 205-218(2019).

    [16] Han J H, Jia M Y, Zhou Z X et al. High-sensitivity cone-beam XLCT using photon counting measurements[J]. Chinese Journal of Lasers, 51, 0307102(2024).

    [26] Li Z Y, Xu B, Chen L F. Normalized cross correlation image matching algorithm based on adaptive step size[J]. Opto-Electronic Engineering, 40, 77-84, 89(2013).

    Tools

    Get Citation

    Copy Citation Text

    Cong Liu, Feixiang Wang, Fen Tao, Guohao Du, Ling Zhang, Jun Wang, Biao Deng. X-Ray Nano-Resolution Stereo Imaging and Its Application in Chip Characterization[J]. Acta Optica Sinica, 2024, 44(13): 1334002

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category: X-Ray Optics

    Received: Jan. 26, 2024

    Accepted: Mar. 18, 2024

    Published Online: Jul. 4, 2024

    The Author Email: Wang Feixiang (wangfx@sari.ac.cn), Deng Biao (dengb@sari.ac.cn)

    DOI:10.3788/AOS240575

    CSTR:32393.14.AOS240575

    Topics