Chinese Journal of Lasers, Volume. 49, Issue 22, 2202009(2022)
High-Speed Parallel Two-Photon Laser Direct Writing Lithography System
Fig. 1. Simulation results of beam separation obtained with weighted GS algorithm. (a) Hologram of six-beam array; (b) focused light intensity of six-beam array; (c) variation of six-beam array’s uniformity and standard deviation with the number of iterations
Fig. 2. Multibeam parallel two-photon laser direct writing system based on polygon laser scanner. (a) Experimental setup;(b) optical path diagram
Fig. 3. Image rotator design scheme and simulation results. (a) Image rotator consists of a mirror and a prism; (b) image on detector at image rotator of 0°;(c) image on detector at image rotator of 22.5°;(d) image on detector at image rotator of 45°
Fig. 4. System parameters calibration. (a) Six-beam spacing uniformity; (b) feature size is about 150 nm and line changes to lattice when the line-width is below 150 nm; (c) rotator adjustment effect, for a rotary stage with a resolution of 0.02°,the accuracy of period spacing adjustment is up to 0.3 nm; (d) direct writing speed calibration, the speed from top to bottom is 1.494, 2.961, 5.845, 7.770 m/s, respectively
Fig. 5. Programming writing results. (a) Dot writing test, scale bar is 500 nm; (b) multichannel programming writing, scale bar is 10 μm
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Hongqing Wang, Jisen Wen, Zhenyao Yang, Mengbo Tang, Qiuyuan Sun, Chengpeng Ma, Ziang Wang, Lanxin Zhan, Xiaoyi Zhang, Chun Cao, Xiaoming Shen, Chenliang Ding, Cuifang Kuang. High-Speed Parallel Two-Photon Laser Direct Writing Lithography System[J]. Chinese Journal of Lasers, 2022, 49(22): 2202009
Category: laser manufacturing
Received: Jan. 17, 2022
Accepted: Mar. 9, 2022
Published Online: Nov. 9, 2022
The Author Email: Ding Chenliang (dingcl@zhejianglab.com), Kuang Cuifang (cfkuang@zju.edu.cn)