Chinese Journal of Lasers, Volume. 49, Issue 22, 2202009(2022)

High-Speed Parallel Two-Photon Laser Direct Writing Lithography System

Hongqing Wang1, Jisen Wen1, Zhenyao Yang1, Mengbo Tang1, Qiuyuan Sun1, Chengpeng Ma1, Ziang Wang2, Lanxin Zhan1, Xiaoyi Zhang1, Chun Cao1, Xiaoming Shen1, Chenliang Ding1、*, and Cuifang Kuang1,2、**
Author Affiliations
  • 1Research Center for Intelligent Chips and Devices, Zhejiang Laboratory, Hangzhou 310023, Zhejiang, China
  • 2State Key Laboratory of Modern Optical Instrumentation, College of Optical Science and Engineering, Zhejiang University, Hangzhou 310027, Zhejiang, China
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    Figures & Tables(6)
    Simulation results of beam separation obtained with weighted GS algorithm. (a) Hologram of six-beam array; (b) focused light intensity of six-beam array; (c) variation of six-beam array’s uniformity and standard deviation with the number of iterations
    Multibeam parallel two-photon laser direct writing system based on polygon laser scanner. (a) Experimental setup;(b) optical path diagram
    Image rotator design scheme and simulation results. (a) Image rotator consists of a mirror and a prism; (b) image on detector at image rotator of 0°;(c) image on detector at image rotator of 22.5°;(d) image on detector at image rotator of 45°
    System parameters calibration. (a) Six-beam spacing uniformity; (b) feature size is about 150 nm and line changes to lattice when the line-width is below 150 nm; (c) rotator adjustment effect, for a rotary stage with a resolution of 0.02°,the accuracy of period spacing adjustment is up to 0.3 nm; (d) direct writing speed calibration, the speed from top to bottom is 1.494, 2.961, 5.845, 7.770 m/s, respectively
    Programming writing results. (a) Dot writing test, scale bar is 500 nm; (b) multichannel programming writing, scale bar is 10 μm
    • Table 1. Two-photo direct writing scanning speed, nominal feature sizes and the number of beams reported in recent literature

      View table

      Table 1. Two-photo direct writing scanning speed, nominal feature sizes and the number of beams reported in recent literature

      Positioning mechanismScanning speed /(mm·s-1)Nominal feature size /μmThe number of beamsSystem indexRef.
      Stepper motor stage10114.0[31]
      Piezo stage0.090.2812.5[21]
      0.060.06513.0[20]
      301.514.3[19]
      0.41011.6[18]
      11604.8[13]
      Digital micromirror device (DMD)50.544.6[32]
      Galvo mirror70.7814.0[26]
      2000.216.0[24]
      1030.08616.1[25]
      400115.6[22]
      4000.596.9[1]
      0.10.1293.9[33]
      10.1165.2[16]
      Resonant-galvo mirror8200116.9[27]
      This work77700.1568.4 
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    Hongqing Wang, Jisen Wen, Zhenyao Yang, Mengbo Tang, Qiuyuan Sun, Chengpeng Ma, Ziang Wang, Lanxin Zhan, Xiaoyi Zhang, Chun Cao, Xiaoming Shen, Chenliang Ding, Cuifang Kuang. High-Speed Parallel Two-Photon Laser Direct Writing Lithography System[J]. Chinese Journal of Lasers, 2022, 49(22): 2202009

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    Paper Information

    Category: laser manufacturing

    Received: Jan. 17, 2022

    Accepted: Mar. 9, 2022

    Published Online: Nov. 9, 2022

    The Author Email: Ding Chenliang (dingcl@zhejianglab.com), Kuang Cuifang (cfkuang@zju.edu.cn)

    DOI:10.3788/CJL202249.2202009

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