High-Speed Parallel Two-Photon Laser Direct Writing Lithography System

Hongqing Wang; Jisen Wen; Zhenyao Yang; Mengbo Tang; Qiuyuan Sun; Chengpeng Ma; Ziang Wang; Lanxin Zhan; Xiaoyi Zhang; Chun Cao; Xiaoming Shen; Chenliang Ding; Cuifang Kuang

doi:10.3788/CJL202249.2202009

Chinese Journal of Lasers, Volume. 49, Issue 22, 2202009(2022)

High-Speed Parallel Two-Photon Laser Direct Writing Lithography System

Hongqing Wang¹, Jisen Wen¹, Zhenyao Yang¹, Mengbo Tang¹, Qiuyuan Sun¹, Chengpeng Ma¹, Ziang Wang², Lanxin Zhan¹, Xiaoyi Zhang¹, Chun Cao¹, Xiaoming Shen¹, Chenliang Ding^1、*, and Cuifang Kuang^1,2、**

Author Affiliations

¹Research Center for Intelligent Chips and Devices, Zhejiang Laboratory, Hangzhou 310023, Zhejiang, China

²State Key Laboratory of Modern Optical Instrumentation, College of Optical Science and Engineering, Zhejiang University, Hangzhou 310027, Zhejiang, China

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Hongqing Wang, Jisen Wen, Zhenyao Yang, Mengbo Tang, Qiuyuan Sun, Chengpeng Ma, Ziang Wang, Lanxin Zhan, Xiaoyi Zhang, Chun Cao, Xiaoming Shen, Chenliang Ding, Cuifang Kuang. High-Speed Parallel Two-Photon Laser Direct Writing Lithography System[J]. Chinese Journal of Lasers, 2022, 49(22): 2202009

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Paper Information

Category: laser manufacturing

Received: Jan. 17, 2022

Accepted: Mar. 9, 2022

Published Online: Nov. 9, 2022

The Author Email: Ding Chenliang (dingcl@zhejianglab.com), Kuang Cuifang (cfkuang@zju.edu.cn)

DOI:10.3788/CJL202249.2202009

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology