[1] Levinson H J[M]. Principles of lithography, 162-200(2010).

[2] Mack C A. Analytical expression for impact of linewidth roughness on critical dimension uniformity[J]. Journal of Micro/Nanolithography, MEMS, and MOEMS, 13, 020501(2014). http://spie.org/Publications/Journal/10.1117/1.JMM.13.2.020501

[3] Avizemer D, Sharoni O, Oshemkov S et al. Critical dimension control using ultra short laser for improving wafer critical dimension uniformity[J]. Journal of Micro/Nanolithography, MEMS, and MOEMS, 14, 033510(2015).

[4] Guo L P, Wang X Z, Huang H J. Analysis of illumination pupil filling ellipticity for critical dimensions control in photolithography[J]. Chinese Optics Letters, 4, 237-239(2006). http://www.opticsjournal.net/Articles/Abstract?aid=OJ060606000588KgNjQm

[5] Guo L P, Huang H J, Wang X Z. Study of integrator rod in step and scan lithography[J]. Acta Photonica Sinica, 35, 981-985(2006).

[6] Dimas C F, Read S, Kuta J J. Integrating rod homogeneity as a function of cross-sectional shape[J]. Proceedings of SPIE, 4768, 82-92(2002). http://spie.org/x648.html?product_id=482180

[7] Arai J, Kawai H, Okano F. Microlens arrays for integral imaging system[J]. Applied Optics, 45, 9066-9078(2006). http://www.ncbi.nlm.nih.gov/pubmed/17151745

[8] Zimmermann M, Lindlein N, Voelkel R et al. Microlens laser beam homogenizer: from theory to application[J]. Proceedings of SPIE, 6663, 666302(2007). http://spie.org/Publications/Proceedings/Paper/10.1117/12.731391

[9] Feng Z, Huang L, Jin G et al. Designing double freeform optical surfaces for controlling both irradiance and wavefront[J]. Optics Express, 21, 28693-28701(2013). http://europepmc.org/abstract/med/24514381

[10] Jin Y, Hassan A, Jiang Y J. Freeform microlens array homogenizer for excimer laser[J]. Optics Express, 24, 24846-24858(2016). http://europepmc.org/abstract/med/27828426

[11] Brandt R J. -06-20)[2018-02-27][P/OL]. Calif P. Uniformity filter: US6076942.(2000). https://www.bing.com/search?q=US6076942.

[12] Stroeldraijer J M D, Fey F H A et al. -05-09) [2018-02-27](2001). https://www.bing.com/search?q=EP0952491A3.

[14] Cheng W L, Zhang Y B, Zhu J et al. Programmable uniformity correction by using plug-in finger arrays in advanced lithography system[J]. Optics Communications, 392, 77-85(2017). http://www.sciencedirect.com/science/article/pii/S0030401817300330

[15] Zhang W, Gong Y. Vector analysis of diffractive optical elements for off-axis illumination of projection lithography system[J]. Acta Optica Sinica, 31, 1005002(2011).

[16] Tounai K, Tanabe H, Nozue H et al. Resolution improvement with annular illumination[J]. Proceedings of SPIE, 1927, 137-157(1993). http://spie.org/Publications/Proceedings/Paper/10.1117/12.130365

[17] Wu R M, Li H F, Zheng Z R et al. Freeform lens arrays for off-axis illumination in an optical lithography system[J]. Applied Optics, 50, 725-732(2011). http://www.opticsinfobase.org/abstract.cfm?URI=ao-50-5-725

[18] Lü Y F, Dong Y, Li S T et al. Modified algorithm for designing of diffractive optical element to decrease the phase singular spots[J]. Acta Optica Sinica, 32, 0505001(2012).

[19] Hu Z H, Yang B X, Zhu J et al. Design of diffractive optical element for pupil shaping optics in projection lithography system[J]. Chinese Journal of Lasers, 40, 0616001(2013).

[20] Hu Z H, Yang B X, Zhu J et al. Far-field multi-parameter measurement of diffractive optical element for pupil shaping in lithography system[J]. Chinese Journal of Lasers, 40, 0908001(2013).