High Precision Correction Method of Illumination Field Uniformity for Photolithography Illumination System

Weilin Cheng; Fang Zhang; Dongliang Lin; Aijun Zeng; Baoxi Yang; Huijie Huang

doi:10.3788/AOS201838.0722001

Acta Optica Sinica, Volume. 38, Issue 7, 0722001(2018)

High Precision Correction Method of Illumination Field Uniformity for Photolithography Illumination System

Weilin Cheng^1,2, Fang Zhang¹, Dongliang Lin^1,2, Aijun Zeng^1,2, Baoxi Yang^1,2, and Huijie Huang^1,2、*

¹ Laboratory of Information Optics and Optoelectronic Technology, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

² University of Chinese Academy of Sciences, Beijing 100049, China

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Weilin Cheng, Fang Zhang, Dongliang Lin, Aijun Zeng, Baoxi Yang, Huijie Huang. High Precision Correction Method of Illumination Field Uniformity for Photolithography Illumination System[J]. Acta Optica Sinica, 2018, 38(7): 0722001

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Paper Information

Category: Optical Design and Fabrication

Received: Jan. 8, 2018

Accepted: --

Published Online: Sep. 5, 2018

The Author Email: Huang Huijie (huanghuijie@siom.ac.cn)

DOI:10.3788/AOS201838.0722001

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