Acta Optica Sinica, Volume. 38, Issue 7, 0722001(2018)
High Precision Correction Method of Illumination Field Uniformity for Photolithography Illumination System
Fig. 1. Schematics of illumination system including finger array uniformity corrector. (a) Schematic of photolithography illumination system; (b) schematic of integral uniformity corrector for illumination system
Fig. 2. Schematic of illumination field point at the focal plane of condenser lens group and its corresponding spread area at the adjustment plane (e.g. conventional illumination mode)
Fig. 3. Schematic of relationship between fingers and pupil shape area in the correction plane
Fig. 4. Schematic of shape and layout of fingers in general finger array correction method
Fig. 5. Schematics of adjustment process for general finger array correction methods. (a) Uncorrected illumination filed; (b) corrected by one pair of fingers; (c) corrected by two pairs of fingers
Fig. 6. Schematics of adjustment process for uniformity correction method with staggered fingers. (a) Uncorrected illumination filed; (b)-(g) single corrected process
Fig. 8. Schematics of correction effect of different structures of finger fore-end. (a) Chamfer rectangle; (b) circle rectangle
Fig. 9. Schematic of adjustment for uniformity correction method with staggered and chamfered fingers
Fig. 10. Schematic of adjustment for uniformity correction method with staggered, chamfered and double layout fingers
Fig. 14. Integral uniformity distributions adjusted by different fingers arrangements. (a) Conventional illumination mode with σ=0.15; (b) conventional illumination mode with σ=0.93; (c) annular illumination mode with σin=0.16 and σout=0.36; (d) annular illumination mode with σin=0.76 and σout=0.96
Fig. 16. Integral uniformity distributions adjusted by staggered, chamfered and double layout fingers arrangement. (a) Conventional illumination mode with σ=0.15; (b) conventional illumination mode with σ=0.93; (c) annular illumination mode with σin=0.16 and σout=0.36; (d) annular illumination mode with σin=0.76 and σout=0.96
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Weilin Cheng, Fang Zhang, Dongliang Lin, Aijun Zeng, Baoxi Yang, Huijie Huang. High Precision Correction Method of Illumination Field Uniformity for Photolithography Illumination System[J]. Acta Optica Sinica, 2018, 38(7): 0722001
Category: Optical Design and Fabrication
Received: Jan. 8, 2018
Accepted: --
Published Online: Sep. 5, 2018
The Author Email: Huang Huijie (huanghuijie@siom.ac.cn)