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Chinese Journal of Lasers, Volume. 47, Issue 4, 401005(2020)

ICP Etching Process of GaAs/AlGaAs for Vertical-Cavity Surface-Emitting Lasers

Wang Yu1,2, Zhou Yanping2、*, Li Maolin2, Zuo Chao2, and Yang Bingjun2
Author Affiliations
  • 1School of Science, Changchun University, Changchun, Jilin 130022, China
  • 2ULVAC Research Center Suzhou Co., Ltd., Suzhou, Jiangsu 215026, China
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    Wang Yu, Zhou Yanping, Li Maolin, Zuo Chao, Yang Bingjun. ICP Etching Process of GaAs/AlGaAs for Vertical-Cavity Surface-Emitting Lasers[J]. Chinese Journal of Lasers, 2020, 47(4): 401005

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    Paper Information

    Category: laser devices and laser physics

    Received: Oct. 14, 2019

    Accepted: --

    Published Online: Apr. 8, 2020

    The Author Email: Yanping Zhou (yanping_zhou@ulvac.com)

    DOI:10.3788/CJL202047.0401005

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology