Chinese Journal of Lasers, Volume. 51, Issue 8, 0803101(2024)

Dynamic Damage Process of HfO2/SiO2 Anti‑Reflection Coatings Under 1064 nm Nanosecond Laser Irradiation

Chengjiang Xiang1,2, Xiaofeng Liu2,3、*, Chunxian Tao1, Dawei Li2,3, Yuan’an Zhao2,3,4、**, Ziyuan Xu2, Shuai Kun2, He Gong1,2, Jian Sun2,3, Weili Zhang2,3, Yuchuan Shao3,4,5, and Jianda Shao2,3,4,5
Author Affiliations
  • 1School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China
  • 2Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 3Key Laboratory of High Power Laser Materials, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
  • 4Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China
  • 5Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou 310024, Zhejiang , China
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    Figures & Tables(14)
    Schematic of nanosecond laser damage time-resolved measurement device
    Transmittance curve of anti-reflection coating
    Working states of anti-reflection coating. (a) Forward process when placing coating on laser incidence surface; (b) reverse process when placing coating on laser exit surface
    Damage morphologies in forward process. (a) Pit without layer peeling-off; (b) pit with layer peeling-off; (a1) and (b1) are SEM images of Figs.4(a) and (b), respectively; (a2) and (b2) are enlarged images of pits in Figs.4(a1) and (b1), respectively; (a3) and (b3) are SEM images of undamaged areas shown in dashed boxes in Figs.4(a1) and (b1), respectively; (a4) and (b4) are SEM images of color change areas shown in dashed boxes in Figs.4(a1) and (b1), respectively; (a5) and (b5) are cross-sectional views of pits in Figs.4(a) and (b), respectively; (b6) is cross-sectional view of layer peeling-off boundary at white dashed line in Fig.4(b1)
    Damage morphologies in reverse process. (a) Pit without layer peeling-off; (b) pit with layer peeling-off; (a1) and (b1) are SEM images of Figs.5(a) and (b), respectively; (a2) and (b2) are enlarged images of pits in Figs.5(a1) and (b1), respectively; (a3) and (b3) are SEM images of undamaged areas shown in dashed boxes in Figs.5(a1) and (b1), respectively; (a4) and (b4) are SEM images of color change areas shown in dashed boxes in Figs.5(a1) and (b1), respectively; (a5) is cross-sectional view of pit boundary shown in white dashed boxes in Fig.5(a2); (b5) is surface SEM image of pit with layer peeling-off after local FIB in Fig.5(b1); (b6) is cross-sectional view of pit in Fig.5(b2); (b7) is cross-sectional view of pit boundary shown in white dashed boxes in Fig.5(b5); (b8) is cross-sectional view of layer peeling-off boundary shown in dashed boxes in Fig.5(b5)
    Size statistics of various damage pits and peeling-off coating layer. (a) Damage center pit; (b) peeling-off coating layer
    Damage dynamic process of pits with layer peeling-off in forward process
    Damage dynamic process of pits without layer peeling-off in forward process
    Dynamic damage process of pits with layer peeling-off in reverse process
    Dynamic damage process of pits without layer peeling-off in reverse process
    Electric field simulations for forward and reverse processes of anti-reflection coatings. (a) Forward process; (b) reverse process
    Shielding effect of plasma on laser pulse. (a) Forward process; (b) reverse process
    Shock wave radius versus time corresponding to different damage morphologies (points and circles represent data, and lines represent fitted curves)
    • Table 1. Shock wave energy corresponding to different damages

      View table

      Table 1. Shock wave energy corresponding to different damages

      ProcessShock wave energy /mJ
      Pits with layer peeling-offPits without layer peeling-off
      Reverse process17.231.89
      Forward process0.720.18
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    Chengjiang Xiang, Xiaofeng Liu, Chunxian Tao, Dawei Li, Yuan’an Zhao, Ziyuan Xu, Shuai Kun, He Gong, Jian Sun, Weili Zhang, Yuchuan Shao, Jianda Shao. Dynamic Damage Process of HfO2/SiO2 Anti‑Reflection Coatings Under 1064 nm Nanosecond Laser Irradiation[J]. Chinese Journal of Lasers, 2024, 51(8): 0803101

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    Paper Information

    Category: Thin Films

    Received: Aug. 1, 2023

    Accepted: Sep. 18, 2023

    Published Online: Mar. 29, 2024

    The Author Email: Liu Xiaofeng (liuxiaofeng@siom.ac.cn), Zhao Yuan’an (yazhao@siom.ac.cn)

    DOI:10.3788/CJL231071

    CSTR:32183.14.CJL231071

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