Dynamic Damage Process of HfO<sub>2</sub>/SiO<sub>2 </sub>Anti‑Reflection Coatings Under 1064 nm Nanosecond Laser Irradiation

Chengjiang Xiang; Xiaofeng Liu; Chunxian Tao; Dawei Li; Yuan’an Zhao; Ziyuan Xu; Shuai Kun; He Gong; Jian Sun; Weili Zhang; Yuchuan Shao; Jianda Shao

doi:10.3788/CJL231071

Chinese Journal of Lasers, Volume. 51, Issue 8, 0803101(2024)

Dynamic Damage Process of HfO₂/SiO₂Anti‑Reflection Coatings Under 1064 nm Nanosecond Laser Irradiation

Chengjiang Xiang^1,2, Xiaofeng Liu^2,3、*, Chunxian Tao¹, Dawei Li^2,3, Yuan’an Zhao^2,3,4、**, Ziyuan Xu², Shuai Kun², He Gong^1,2, Jian Sun^2,3, Weili Zhang^2,3, Yuchuan Shao^3,4,5, and Jianda Shao^2,3,4,5

Author Affiliations

¹School of Optical-Electrical and Computer Engineering, University of Shanghai for Science and Technology, Shanghai 200093, China

²Laboratory of Thin Film Optics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

³Key Laboratory of High Power Laser Materials, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

⁴Center of Materials Science and Optoelectronics Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

⁵Hangzhou Institute for Advanced Study, University of Chinese Academy of Sciences, Hangzhou 310024, Zhejiang , China

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Chengjiang Xiang, Xiaofeng Liu, Chunxian Tao, Dawei Li, Yuan’an Zhao, Ziyuan Xu, Shuai Kun, He Gong, Jian Sun, Weili Zhang, Yuchuan Shao, Jianda Shao. Dynamic Damage Process of HfO₂/SiO₂Anti‑Reflection Coatings Under 1064 nm Nanosecond Laser Irradiation[J]. Chinese Journal of Lasers, 2024, 51(8): 0803101

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Paper Information

Category: Thin Films

Received: Aug. 1, 2023

Accepted: Sep. 18, 2023

Published Online: Mar. 29, 2024

The Author Email: Xiaofeng Liu (liuxiaofeng@siom.ac.cn), Yuan’an Zhao (yazhao@siom.ac.cn)

DOI:10.3788/CJL231071

CSTR:32183.14.CJL231071

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology