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Laser & Optoelectronics Progress, Volume. 61, Issue 21, 2100001(2024)

Progress in Inverse Lithography Technology

Futian Wang*, Juan Wei, Cuixiang Wang, Miao Jiang, Yu Mu, Chunlong Yu, Ruihua Liu, Fu Li, Jingjing Fan, Jinlai Liu, Jingkang Qin, Enqiang Tian, Song Sun, Chong Wang, Xiaonan Liu, Hao Yang, Di Liang, Binbin Yan, Liang Li, Qingchen Cao, and Jiangliu Shi
Author Affiliations
  • Lithography Research and Development Department, Beijing Superstring Academy of Memory Technology, Beijing 100176, China
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    Article index updated: Sep. 11, 2025

    The article is cited by 1 article(s) CLP online library. (Some content might be in Chinese.)
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    Futian Wang, Juan Wei, Cuixiang Wang, Miao Jiang, Yu Mu, Chunlong Yu, Ruihua Liu, Fu Li, Jingjing Fan, Jinlai Liu, Jingkang Qin, Enqiang Tian, Song Sun, Chong Wang, Xiaonan Liu, Hao Yang, Di Liang, Binbin Yan, Liang Li, Qingchen Cao, Jiangliu Shi. Progress in Inverse Lithography Technology[J]. Laser & Optoelectronics Progress, 2024, 61(21): 2100001

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    Paper Information

    Category: Reviews

    Received: Jul. 12, 2024

    Accepted: Aug. 20, 2024

    Published Online: Nov. 19, 2024

    The Author Email:

    DOI:10.3788/LOP241676

    CSTR:32186.14.LOP241676

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology