Acta Optica Sinica, Volume. 37, Issue 12, 1231001(2017)
Optical and Mechanical Properties and Microstructures of Nb2O5, Ta2O5 and SiO2 Thin Films Prepared by Ion Beam Sputtering
Figures & Tables(10)
Fig. 2. Transmission curves of Ta2O5 films prepared under different assisted ion source voltages
Fig. 3. Optical constants of different thin films prepared by different methods of EBE, IBAD and IBS when wavelength is 550 nm.(a) Nb2O5; (b) Ta2O5; (c) SiO2
Fig. 4. Stress value of different thin films prepared by three deposition methods of EBE, IBAD and IBS.(a) Nb2O5; (b) Ta2O5; (c) SiO2
Fig. 5. Hardness of different thin films prepared by three deposition methods of EBE, IBAD and IBS.(a) Nb2O5; (b) Ta2O5; (c) SiO2
Fig. 6. Young modulus of different thin films prepared by three deposition methods of EBE, IBAD and IBS.(a) Nb2O5; (b) Ta2O5; (c) SiO2
Fig. 7. Surface morphologies of Ta2O5 thin films prepared by (a) EBE, (b) IBAD, (c) SIBS and (d) DIBS
Fig. 8. Cross-sectional morphologies of Ta2O5 thin films prepared by (a) EBE, (b) IBAD and (c) DIBS
Table 1. Process parameters of IBS deposition
View tableTable 1. Process parameters of IBS deposition
Material Sputtering ion source parameter Assisted ion source parameter Background pressure / (10-4 Pa) Working pressure / (10-2 Pa) Beam current /mA Beam voltage /V Gas flow / (mL·min-1) Beam current /mA Beam voltage /V Gas flow / (mL·min-1) Nb2O5 400 1000 16(Ar) 100 200-800 6(Ar), 18(O2) 1.0 5.0 Ta2O5 400 1000 16(Ar) 100 200-600 6(Ar), 18(O2) 1.0 5.0 SiO2 400 1000 16(Ar) 100 200-600 6(Ar), 18(O2) 1.0 5.1
Table 2. Process parameters of EBE and IBAD
View tableTable 2. Process parameters of EBE and IBAD
Material Temperature /℃ Working pressure /(10-2 Pa) Deposition rate /(nm·s-1) EBE IBAD EBE IBAD EBE IBAD Nb2O5 230 200 2.0 2.0 0.3 0.3 Ta2O5 230 200 2.0 2.0 0.3 0.3 SiO2 230 200 0.3 1.3 0.8 0.8
Tools
Get Citation
Copy Citation Text
Wenjia Yuan, Weidong Shen, Xiaowen Zheng, Chenying Yang, Yueguang Zhang, Bo Fang, Wen Mu, Chaonan Chen, Xu Liu. Optical and Mechanical Properties and Microstructures of Nb2O5, Ta2O5 and SiO2 Thin Films Prepared by Ion Beam Sputtering[J]. Acta Optica Sinica, 2017, 37(12): 1231001
Paper Information
Category: Thin Films
Received: Jul. 3, 2017
Accepted: --
Published Online: Sep. 6, 2018
The Author Email: Shen Weidong (adongszju@hotmail.com)
© Copyright 2018-2021 | Chinese Laser Press.
All Rights Reserved 沪ICP备15018463号-20