Chinese Journal of Lasers, Volume. 51, Issue 18, 1801006(2024)
Fabrication of Dammann Grating Devices Using Femtosecond Laser Direct Writing Assisted by Plasma Etching
Fig. 1. Dammann grating mask patterns. (a) 2×2 Dammann grating; (b) 3×3 Dammann grating; (c) 4×4 Dammann grating;(d) 1×2 vortex Dammann grating
Fig. 2. Simulated results of Dammann grating. (a) 2×2 Dammann grating; (b) 3×3 Dammann grating; (c) 4×4 Dammann grating; (d) 1×2 vortex Dammann grating; (e) 1×2 forked grating
Fig. 3. Flow chart of fabrication of Dammann grating using femtosecond laser direct writing assisted by inductively coupled plasma etching
Fig. 4. Processing effects. (a) Microscopic images of mask plate patterns processed by femtosecond laser; (b) microscopic images of inductively coupled plasma etching results
Fig. 5. Characteristic diagrams by contour instrument. (a) Three-dimensional morphology of Dammann grating; (b) measured depth of Dammann grating
Fig. 6. Test light path and coupling results. (a) Test light path of far field intensity distribution of Dammann grating; (b) coupling results captured on CCD
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Hangjian Zhang, Boning Pang, Dahuai Zheng, Hongyun Chen, Hongliang Liu. Fabrication of Dammann Grating Devices Using Femtosecond Laser Direct Writing Assisted by Plasma Etching[J]. Chinese Journal of Lasers, 2024, 51(18): 1801006
Category: laser devices and laser physics
Received: Mar. 4, 2024
Accepted: May. 31, 2024
Published Online: Sep. 6, 2024
The Author Email: Liu Hongliang (drliuhl@nankai.edu.cn)
CSTR:32183.14.CJL240644