Acta Optica Sinica, Volume. 44, Issue 4, 0431002(2024)
Preparation of X-Ray Multilayers Based on Atomic Layer Deposition
Fig. 3. Relationship between reflectivity of multilayer films of different film systems and grazing angle of X-rays. (a) Changes in reflectivity of multilayer films of different film systems at grazing angles from 0° to 7°; (b) reflectivity of multilayer films of different film systems at primary diffraction peak
Fig. 4. Relationship between reflectivity of HfO2/Al2O3 multilayer films with different periods and grazing angle of X-rays
Fig. 6. Variation of reflectivity of HfO2/Al2O3 multilayers with number of periods
Fig. 7. Cross-sectional TEM images of HfO2/Al2O3 multilayers. (a) Cross-sectional TEM image of 50 layers HfO2/Al2O3 stack films; (b) TEM image after magnification
Fig. 8. X-ray reflectivity measurement and fitting results of HfO2/Al2O3 multilayers
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Lü Wensi, Hongchang Wu, Yanli Li, Xiangdong Kong, Li Han. Preparation of X-Ray Multilayers Based on Atomic Layer Deposition[J]. Acta Optica Sinica, 2024, 44(4): 0431002
Category: Thin Films
Received: Jul. 31, 2023
Accepted: Dec. 12, 2023
Published Online: Feb. 23, 2024
The Author Email: Yanli Li (liyanli@mail.iee.ac.cn), Xiangdong Kong (slkongxd@mail.iee.ac.cn)
CSTR:32393.14.AOS231331