Preparation of X-Ray Multilayers Based on Atomic Layer Deposition

Lü Wensi; Hongchang Wu; Yanli Li; Xiangdong Kong; Li Han

doi:10.3788/AOS231331

Acta Optica Sinica, Volume. 44, Issue 4, 0431002(2024)

Preparation of X-Ray Multilayers Based on Atomic Layer Deposition

Lü Wensi^1,2, Hongchang Wu^1,3, Yanli Li^1、*, Xiangdong Kong^1,2、**, and Li Han^1,2

Author Affiliations

¹Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing 100190, China

²School of Electronic, Electrical, and Communication Engineering, University of Chinese Academy of Sciences, Beijing 100049, China

³School of Physical Science and Technology, Lanzhou University, Lanzhou 730000, Gansu , China

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Lü Wensi, Hongchang Wu, Yanli Li, Xiangdong Kong, Li Han. Preparation of X-Ray Multilayers Based on Atomic Layer Deposition[J]. Acta Optica Sinica, 2024, 44(4): 0431002

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Paper Information

Category: Thin Films

Received: Jul. 31, 2023

Accepted: Dec. 12, 2023

Published Online: Feb. 23, 2024

The Author Email: Yanli Li (liyanli@mail.iee.ac.cn), Xiangdong Kong (slkongxd@mail.iee.ac.cn)

DOI:10.3788/AOS231331

CSTR:32393.14.AOS231331

Topics

laser devices and laser physics

Lasers and Laser Optics

Laser physics

laser manufacturing

Instrumentation, Measurement and Metrology