Chinese Journal of Lasers, Volume. 40, Issue 2, 216001(2013)
Design of Micro-Cylindrical-Lens Array Used for Illumination Uniformization in Lithography Systems
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Xiao Yanfen, Zhu Jing, Yang Baoxi, Hu Zhonghua, Zeng Aijun, Huang Huijie. Design of Micro-Cylindrical-Lens Array Used for Illumination Uniformization in Lithography Systems[J]. Chinese Journal of Lasers, 2013, 40(2): 216001
Paper Information
Category: Optical Design and Fabrication
Received: Aug. 7, 2012
Accepted: --
Published Online: Feb. 4, 2013
The Author Email: Yanfen Xiao (yanfenxiao2007@163.com)
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