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Chinese Journal of Lasers, Volume. 40, Issue 2, 216001(2013)

Design of Micro-Cylindrical-Lens Array Used for Illumination Uniformization in Lithography Systems

Xiao Yanfen1、*, Zhu Jing1, Yang Baoxi1, Hu Zhonghua1,2, Zeng Aijun1, and Huang Huijie1
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    Article index updated: Mar. 10, 2025

    The article is cited by 11 article(s) CLP online library. (Some content might be in Chinese.)
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    Xiao Yanfen, Zhu Jing, Yang Baoxi, Hu Zhonghua, Zeng Aijun, Huang Huijie. Design of Micro-Cylindrical-Lens Array Used for Illumination Uniformization in Lithography Systems[J]. Chinese Journal of Lasers, 2013, 40(2): 216001

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    Paper Information

    Category: Optical Design and Fabrication

    Received: Aug. 7, 2012

    Accepted: --

    Published Online: Feb. 4, 2013

    The Author Email: Yanfen Xiao (yanfenxiao2007@163.com)

    DOI:10.3788/cjl201340.0216001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology