Optoelectronic Technology, Volume. 44, Issue 3, 248(2024)
Design and Experiment of Multi-parameter Thin-film Measurement System
Figures & Tables(5)
Fig. 3. Silicon dioxide thickness and thickness distribution measurement verification, in which (a) (b) (c) (d) are the measurement results of the thickness and thickness distribution of sample 1; (e) (f) (g) (h) are the measurement results of the thickness and thickness distribution of sample 2; (i) (j) (k) (l) are the measurement results of the thickness and thickness distribution of sample 3.
Fig. 4. Tantalum pentoxide thickness and thickness distribution measurement verification, in which (a) (b) (c) (d) are the measurement results of thickness and thickness distribution of sample 4; (e) (f) (g) (h) are the measurement results of thickness and thickness distribution of sample 5; (i) (j) (k) (l) are the measurement results of thickness and thickness distribution of sample 6.
Table 1. Measurement results of film curvature and residual stress
View tableView in ArticleTable 1. Measurement results of film curvature and residual stress
测量方向 ZYGO测量结果/mm 设计系统测量结果/mm 测量偏差/（%） ZYGO计算结果/MPa 设计系统计算结果/MPa 测量偏差/（%） 120 mm 样品1 X轴 3 937 3 906 -0.76 2 185 2 203 -0.82 Y轴 4 289 4 318 0.68 2 006 1 992 0.70 样品2 X轴 4 097 4 131 0.84 2 100 2 082 0.81 Y轴 3 762 3 744 -0.47 2 287 2 298 -0.48 220 mm 样品3 X轴 3 558 3 581 0.65 2 418 2 402 0.66 Y轴 3 272 3 290 -0.55 2 628 2 615 -0.53 样品4 X轴 5 075 5 029 -0.89 1 695 1 771 -0.88 Y轴 4 122 4 143 0.52 2 087 2 077 0.48 120 mm 样品1 X轴 8 214 8 161 -0.64 1 042 1 049 -0.67 Y轴 7 653 7 710 0.75 1 119 1 110 0.80 样品2 X轴 6 845 6 884 0.57 1 251 1 244 0.56 Y轴 7 428 7 391 -0.49 1 152 1 158 -0.52 220 mm 样品1 X轴 10 592 10 629 0.35 808 806 0.74 Y轴 12 383 12 268 -0.92 691 698 -1.01 样品2 X轴 8 927 8 887 0.44 959 963 -0.42 Y轴 6 921 6 967 0.67 1 237 1 229 0.65
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Wei SUN, Shangzhong JIN, Yin ZHANG, Zijuan SUN, Sheng XU. Design and Experiment of Multi-parameter Thin-film Measurement System[J]. Optoelectronic Technology, 2024, 44(3): 248
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Received: Jan. 16, 2024
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Published Online: Mar. 5, 2025
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