Researching | Interface characterization of Mo/Si multilayers

Chinese Optics Letters, Volume. 14, Issue 8, 083401(2016)

Interface characterization of Mo/Si multilayers

Jiaoling Zhao^1,2, Hongbo He^1、*, Hu Wang^1,2, Kui Yi¹, Bin Wang^1,2, and Yun Cui¹

Author Affiliations

¹Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China

²University of Chinese Academy of Sciences, Beijing 100049, China

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Fig. 1. Measured and fitted curve of GIXRR results.

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Fig. 2. (a) Regional XPS scan of the top Si layer for various etching times; (b) in-depth concentrate on the profile of the Mo/Si multilayer.

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Fig. 3. Regional XPS scan of (a) Si 2p and (b) Mo 3d at the Si-on-Mo interface; (c) Si 2p and (d) Mo 3d at the Mo-on-Si interface.

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Fig. 4. (a) HRTEM image for the cross-sectional structure of the Mo/Si multilayer; (b) the cross–sectional profile curve; (c) the Mo layer thickness.

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Fig. 5. (a) Two-layer and four-layer models; (b) the calculated reflectivity of the Mo/Si multilayers with MoSi2 interlayer compounds using the four-layer model.

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Table 1. XPS Photoelectron Curve Fitting Results
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Table 1. XPS Photoelectron Curve Fitting Results
Item Si 2p $Mo 3 d_{5 / 2} Mo 3 d_{3 / 2}$
Charge ${Si}^{2 -}$ ${Si}^{+ 2 x}$ ${Mo}^{4 +}$ ${Mo}^{4 +}$
Composition ${MoSi}_{2}$ ${SiO}_{x}$ ${MoSi}_{2}$ ${MoSi}_{2}$
B. E. S. (eV) 99.4 102.5 228.1 231.3
B. E. M. (eV) 99.4 101.3 228.1 231.3

Table 2. EUV Reflective Calculated Results（Units: Å）
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Table 2. EUV Reflective Calculated Results（Units: Å）
Interlayer $d_{Mo}$ $d_{Si}$ $d_{1}$ $d_{2}$ $σ_{Mo}$ $σ_{Si}$ $σ_{1}$ $σ_{2}$
${MoSi}_{2}$ 24.10 40.61 3.15 2.62 0.11 0.6 1.09 0.25
${Mo}_{5} {Si}_{3}$ 23.09 40.17 3.75 3.69 0.88 0.56 0.7 1.01
${Mo}_{3} Si$ 22.52 40.28 3.18 4.68 1.12 1.01 0.22 0.51

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Jiaoling Zhao, Hongbo He, Hu Wang, Kui Yi, Bin Wang, Yun Cui, "Interface characterization of Mo/Si multilayers," Chin. Opt. Lett. 14, 083401 (2016)

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Paper Information

Category: X-ray Optics

Received: Mar. 2, 2016

Accepted: May. 24, 2016

Published Online: Aug. 3, 2018

The Author Email: Hongbo He (hbhe@siom.ac.cn)

DOI:10.3788/COL201614.083401

Topics

laser devices and laser physics

Lasers and Laser Optics

laser manufacturing

Instrumentation, Measurement and Metrology