Fig. 1. Schematic of polarization imaging based on vector beams

Fig. 2. Intensity of light field along x direction and y direction. (a) x direction; (b) y direction

Fig. 3. Intensity variations of light field along x direction and y direction for a change of 0.01 in the refractive index of film. (a) x direction; (b) y direction

Fig. 4. Intensity variations of light field along x direction and y direction for a change of 1 nm in the film thickness. (a) x direction; (b) y direction

Fig. 5. Average retrieval error of film parameters at different noise levels

Fig. 6. Simulated intensity of reflection light field and deviation of intensity between theoretical prediction and experimental results along x direction and y direction for the surface measurement of a silicon substrate. Simulated intensity of reflection light field along (a) x direction and (b) y direction; deviation between theoretical prediction and experimental results along (c) x direction and (d) y direction

Fig. 7. Simulated intensity of reflection light field and deviation between theoretical prediction and experimental results along x direction and y direction for the surface measurement of a SiO₂ film with a thickness of 100 nm. Simulated intensity of reflection light field along (a) x direction and (b) y direction; deviation between theoretical prediction and experimental results along (c) x direction and (d) y direction