[1] [1] Wang Jian, Sun Junqiang. A novel high-speed all-optical wavelength converter within the 1.5 μm band based on sum-frequency generation［J］. Chinese J. Lasers, 2006, 33(10): 1384～1388

[2] [2] Yan Boxia, Bi Yong, Wang Dongdong et al.. Compact and highly efficient 3.8 W intracavity frequency-doubled Nd:YVO4/PPMgLN green laser［J］. Chinese J. Lasers, 2011, 38(3): 0302007

[3] [3] Liu Tong, Wang Xiaobo, Liu Lei et al.. Mid-infrared synchronously pumped picosecond optical parametric oscillator based on PPMgLN crystal［J］. Chinese J. Lasers, 2011, 38(12): 1202003

[4] [4] Yang Dingzhong, Jiang Peipei, Chen Tao et al.. PPMgLN-based high power optical parametric oscillator pumped by a pulsed fiber laser［J］. Chinese J. Lasers, 2010, 37(1): 34～37

[5] [5] T. Takaoka, M. Fujimura, T. Suhara. Fabrication of ridge waveguides in LiNbO3 thin film crystal by proton-exchange accelerated etching［J］. Electron. Lett., 2009, 45(18): 940～941

[6] [6] S. M. Zhang, K. M. Wang, X. Z. Liu et al.. Planar and ridge waveguides formed in LiNbO3 by proton exchange combined with oxygen ion implantation［J］. Opt. Express, 2010, 18(15): 15609～15617

[7] [7] T. Kishimoto, K. Nakamura. Periodically poled MgO-doped stoichiometric LiNbO3 wavelength converter with ridge-type annealed proton-exchanged waveguide［J］. IEEE Photon. Technol. Lett., 2011, 23(3): 161～163

[8] [8] O. Tadanaga, M. Asobe, H. Miyazawa et al.. Efficient 1.55 μm-band quasi-phase-matched ZnO-doped LiNbO3 wavelength converter with high damage resistance［J］. Electron. Lett., 2003, 39(21): 1525～1527

[9] [9] J. Hopwood. Review of inductively coupled plasmas for plasma processing［J］. Plasma Sources Sci. Technol., 1992, 1(2): 109～116

[10] [10] N. Mitsugi, H. Nagata, K. Shima et al.. Challenges in electron cyclotron resonance plasma etching of LiNbO3 surface for fabrication of ridge optical waveguides［J］. J. Vacuum Sci. Technol. A, 1998, 16(4): 2245～2251

[11] [11] H. Nagata, N. Mitsugi, K. Shima et al.. Growth of crystalline LiF on CF4 plasma etched LiNbO3 substrates［J］. J. Cryst. Growth, 1998, 187(3): 573～576

[12] [12] M. Tamura, S. Yoshikado. Etching characteristics of LiNbO3 crystal by fluorine gas plasma reactive ion etching［J］. Sci. Technol. Adv. Mater., 2001, 2(3-4): 563～569

[13] [13] W. J. Park, W. S. Yang, W. K. Kim et al.. Ridge structure etching of LiNbO3 crystal for optical waveguide applications［J］. Opt. Mater., 2006, 28(3): 216～220

[14] [14] Ying Zaisheng, Huang Tao. Reactive ion etching of LiNbO3［J］. Microfabrication Technology, 1992, (1): 35～38