Chinese Journal of Lasers, Volume. 47, Issue 7, 701027(2020)

Design and Realization of a Novel Poly-Silicon Light-Emitting Device Based on Standard CMOS Technology

Ai Kang1, Cheng Junji1, Zhu Kunfeng2, Wu Kejun1, Liu Zhongyuan3, Liu Zhiwei1, Zhao Jianming1, Huang Lei2, and Xu Kaikai1、*
Author Affiliations
  • 1State Key Laboratory of Electronic Thin Films and Integrated Devices, University of Electronic Science and Technology of China, Chengdu, Sichuan 610054, China
  • 2The 24th Research Institute of China Electronics Technology Group Corporation, Chongqing, Sichuan 400060, China
  • 3The 44th Research Institute of China Electronics Technology Group Corporation, Chongqing, Sichuan 400060, China
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    Figures & Tables(7)
    Cross section of new poly-silicon device
    Energy distributions of electrons and holes in the conduction band and valence band of Si for various excitation conditions, momentum changes, and possible subsequent photonic transitions
    Electrons and holes movement in the device at 25 V bias voltage
    Electric field intensity distribution of four junctions depletion regions in the device at 25 V bias voltage
    Spectral graph at 25 mA drive current
    Relationship between light intensity and driving current
    Relationship between driving current and driving voltage
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    Ai Kang, Cheng Junji, Zhu Kunfeng, Wu Kejun, Liu Zhongyuan, Liu Zhiwei, Zhao Jianming, Huang Lei, Xu Kaikai. Design and Realization of a Novel Poly-Silicon Light-Emitting Device Based on Standard CMOS Technology[J]. Chinese Journal of Lasers, 2020, 47(7): 701027

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    Paper Information

    Special Issue:

    Received: Jan. 10, 2020

    Accepted: --

    Published Online: Jul. 10, 2020

    The Author Email: Xu Kaikai (kaikaix@uestc.edu)

    DOI:10.3788/CJL202047.0701027

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