[1] Fan Z X, Shao J D, Yi K[M]. Optical film and its application, 176-177(2014).

[2] Hunt J H. National ignition facility performance review 1999[M]. California: Technical Information Department's Digital Library, 163-180(2000).

[3] Prené P, Priotton J J, Beaurain L et al. Preparation of a sol-gel broadband antireflective and scratch-resistant coating for amplifier blastshields of the French laser LIL[J]. Journal of Sol-Gel Science and Technology, 19, 533-537(2000).

[4] Miller P E, Bude J D, Suratwala T I et al. Fracture-induced subbandgap absorption as a precursor to optical damage on fused silica surfaces[J]. Optics Letters, 35, 2702-2704(2010).

[5] Spaeth M L, Manes K R, Kalantar D H et al. Description of the NIF laser[J]. Fusion Science and Technology, 69, 25-145(2016).

[6] Zou L P, Li X G, Zhang Q H et al. An abrasion-resistant and broadband antireflective silica coating by block copolymer assisted sol-gel method[J]. Langmuir, 30, 10481-10486(2014).

[7] Xiong H, Shen B, Chen Z Y et al. Preparation of ultra-broadband antireflective coatings for amplifier blast shields by a sol-gel method[J]. High Power Laser Science and Engineering, 5, e29(2017).

[8] Kang J. Ultraviolet anti-reflective films[D]. Nanjing: Southeast University(2016).

[9] Ross J S, Divol L, Sorce C et al. Ultraviolet Thomson scattering measurements of the electron and ion features with an energetic 263 nm probe[J]. Journal of Instrumentation, 6, 08004(2011).

[10] Ross J S, Kline J L, Yang S et al. 81(10): 10D524(2010).

[11] Katz J, Boni R, Sorce C et al. 83(10): 10E349(2012).

[12] Aegerter M A, Mennig M. Sol-gel technologies for glass producers and users[M]. New York: Kluwer Academic Publishers, 38-39(2004).

[13] Zhang R D, Yan H W, Lü H B et al. Changes of thickness and refractive index of silica sol-gel film by dip coating process[J]. High Power Laser and Particle Beams, 26, 072005(2014).

[14] Tang J F, Zheng Q[M]. Shanghai: Shanghai Scientific & Technical Publishers, 117(1984).

[15] Zhu Y Q. Study on ultraviolet anti-reflection coating at 266 nm with high laser-induced damage threshold[J]. Vacuum, 49, 75-77(2012).

[16] Cui X M, Ding R M, Wang M C et al. In situ surface assembly derived ultralow refractive index MgF2-SiO2 hybrid film for tri-layer broadband antireflective coating[J]. Advanced Optical Materials, 4, 722-730(2016).

[17] Shang S Z, Shao J D, Fan Z X. Low-loss 193 nm anti-reflection coatings[J]. Acta Physica Sinica, 57, 1946-1950(2008).

[18] Yang F, Shen J, Wu G M et al. Laser damage of sol-gel thin film[J]. High Power Laser and Particle Beams, 15, 439-443(2003).

[19] Chen X Q, Zu X T, Zheng W G et al. Experimental research of laser-induced damage mechanism of the sol-gel SiO2 and IBSD SiO2 thin films[J]. Acta Physica Sinica, 55, 1201-1206(2006).

[20] Yang Y J, Zhang L, Xu Y et al. Anti-reflective mesoporous SiO2 films with high laser-induced damage threshold[J]. High Power Laser and Particle Beams, 20, 935-938(2008).

[21] Xu J, Zhong Z Q, Huang R S et al. Thermal damages on thin-film components induced by surface impurities and its statistic characteristics[J]. Laser & Optoelectronics Progress, 55, 103101(2018).

[22] Wang G X, Su J H, Xu J Q et al. Ignition time of laser-induced film plasma and its influence factors[J]. Acta Optica Sinica, 37, 0431001(2017).

[23] Xiong H, Tang Y X, Hu L L et al. Stability of surface-modified porous silica antireflective coating[J]. Acta Optica Sinica, 39, 0831001(2019).