Acta Optica Sinica, Volume. 40, Issue 22, 2216001(2020)
Porous Silica Antireflective Film at Ultraviolet Laser Wavelength (266 nm)
Fig. 2. Optical properties of fourth harmonic generation SiO2 antireflective films. (a) Transmittance curves; (b) transmittance values at 266 nm
Fig. 4. Surface roughness (root-mean-square) of fourth harmonic generation SiO2 antireflective films
Fig. 7. Laser damage test of fourth harmonic generation SiO2 antireflective films. (a) Laser-induced damage threshold; (b) damage morphology of 1# film
Fig. 8. Properties of fourth harmonic generation SiO2 antireflective films in high humidity environment. (a) Transmittance change at 266 nm; (b) contact angle change
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Bin Shen, Huai Xiong, Xu Zhang, Haiyuan Li. Porous Silica Antireflective Film at Ultraviolet Laser Wavelength (266 nm)[J]. Acta Optica Sinica, 2020, 40(22): 2216001
Category: Materials
Received: Jul. 6, 2020
Accepted: Jul. 31, 2020
Published Online: Oct. 25, 2020
The Author Email: Shen Bin (bingo2011@siom.ac.cn)