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Acta Optica Sinica, Volume. 40, Issue 22, 2216001(2020)

Porous Silica Antireflective Film at Ultraviolet Laser Wavelength (266 nm)

Bin Shen*, Huai Xiong, Xu Zhang, and Haiyuan Li
Author Affiliations
  • Key Laboratory of High Power Laser and Physics, Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai 201800, China
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    Article index updated: Mar. 10, 2025

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    Bin Shen, Huai Xiong, Xu Zhang, Haiyuan Li. Porous Silica Antireflective Film at Ultraviolet Laser Wavelength (266 nm)[J]. Acta Optica Sinica, 2020, 40(22): 2216001

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    Paper Information

    Category: Materials

    Received: Jul. 6, 2020

    Accepted: Jul. 31, 2020

    Published Online: Oct. 25, 2020

    The Author Email: Shen Bin (bingo2011@siom.ac.cn)

    DOI:10.3788/AOS202040.2216001

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology