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Chinese Optics Letters, Volume. 14, Issue 8, 081202(2016)

Measurement of small wavelength shifts based on total internal reflection heterodyne interferometry

Meng-Chang Hsieh1、*, Jiun-You Lin2, and Chia-Ou Chang1,3
Author Affiliations
  • 1Institute of Applied Mechanics, National Taiwan University, Taipei 10617, China
  • 2Department of Mechatronics Engineering, National Changhua University of Education, Changhua 500, China
  • 3College of Mechanical Engineering, Guangxi University, Nanning 530004, China
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    Figures&Tables (6)
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    Figures & Tables(6)
    Schematic diagram of the wavelength shifts measurement architecture.

    Fig. 1. Schematic diagram of the wavelength shifts measurement architecture.

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    Relation curve of phase difference and wavelength.

    Fig. 2. Relation curve of phase difference and wavelength.

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    Theoretical simulation of sensitivity versus wavelength.

    Fig. 3. Theoretical simulation of sensitivity versus wavelength.

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    Theoretical simulation of resolution Δλerr versus wavelength.

    Fig. 4. Theoretical simulation of resolution Δλerr versus wavelength.

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    Relation curve of phase difference and wavelength of the diffraction beam with different orders.

    Fig. 5. Relation curve of phase difference and wavelength of the diffraction beam with different orders.

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    • Table 1. Uncertainty Errors

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      Table 1. Uncertainty Errors

      Uncertainty errorsPhase errors (deg.)Note
      The SHE0.02The resolution of the polarimeter (for calibrating the POL, ANr, and ANt) in this experiment was 0.5°
      The PME0.35The PME (the extinction ratio of the polarizer was 10−5) was predictable and could be deduced[20].
      The ARLIA0.01
      The GPE0.22The theoretical calculation based on 3% period errors (632 to 633 nm, Δλ=1  nm)
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    Meng-Chang Hsieh, Jiun-You Lin, Chia-Ou Chang, "Measurement of small wavelength shifts based on total internal reflection heterodyne interferometry," Chin. Opt. Lett. 14, 081202 (2016)

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    Paper Information

    Category: Instrumentation, measurement, and metrology

    Received: Jan. 12, 2016

    Accepted: Jun. 14, 2016

    Published Online: Aug. 3, 2018

    The Author Email: Meng-Chang Hsieh (jang1985@msn.com)

    DOI:10.3788/COL201614.081202

    Topics

    laser devices and laser physics
    Lasers and Laser Optics
    Laser physics
    laser manufacturing
    Instrumentation, Measurement and Metrology