Chinese Journal of Lasers, Volume. 39, Issue 4, 416001(2012)

Design of Uniform Illumination Optical Source with 365 nm LED and Application in Lithography

Wang Xiangxian1,2、*, Wang Bo1, Fu Qiang1, Chen Yikai1, Hu Jigang1, Zhang Douguo1, and Ming Hai1
Author Affiliations
  • 1[in Chinese]
  • 2[in Chinese]
  • show less

    Arrangements of point light sources array with 365 nm ultraviolet LED and focusing lens are designed and optimized. Area light source with uniform illumination and high intensity is achieved based on arrangements system. Lithography experiment with contact exposure method is realized with the optimized area optical source. Lithographic patterns are consistent with mask. The lithography method based on uniform area optical source from 365 nm LED arrays has advantages of simple structure, energy conservation and environmental protection.

    Tools

    Get Citation

    Copy Citation Text

    Wang Xiangxian, Wang Bo, Fu Qiang, Chen Yikai, Hu Jigang, Zhang Douguo, Ming Hai. Design of Uniform Illumination Optical Source with 365 nm LED and Application in Lithography[J]. Chinese Journal of Lasers, 2012, 39(4): 416001

    Download Citation

    EndNote(RIS)BibTexPlain Text
    Save article for my favorites
    Paper Information

    Category:

    Received: Oct. 12, 2011

    Accepted: --

    Published Online: Mar. 17, 2012

    The Author Email: Wang Xiangxian (wangxx869@126.com)

    DOI:10.3788/cjl201239.0416001

    Topics