Chinese Journal of Lasers, Volume. 39, Issue 4, 416001(2012)
Design of Uniform Illumination Optical Source with 365 nm LED and Application in Lithography
Arrangements of point light sources array with 365 nm ultraviolet LED and focusing lens are designed and optimized. Area light source with uniform illumination and high intensity is achieved based on arrangements system. Lithography experiment with contact exposure method is realized with the optimized area optical source. Lithographic patterns are consistent with mask. The lithography method based on uniform area optical source from 365 nm LED arrays has advantages of simple structure, energy conservation and environmental protection.
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Wang Xiangxian, Wang Bo, Fu Qiang, Chen Yikai, Hu Jigang, Zhang Douguo, Ming Hai. Design of Uniform Illumination Optical Source with 365 nm LED and Application in Lithography[J]. Chinese Journal of Lasers, 2012, 39(4): 416001
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Received: Oct. 12, 2011
Accepted: --
Published Online: Mar. 17, 2012
The Author Email: Wang Xiangxian (wangxx869@126.com)