Fig. 1. Schematic diagrams of fabrication process

Fig. 2. Pictures of the fabrication process

Fig. 3. （a）Mesa with ITO after wet etching；（b）Mesa with ITO after ICP.

Fig. 4. （a）Mesa etching without HMDS；（b）Mesa etching with HMDS.

Fig. 5. Sectional view of mesa with electrode

Fig. 6. Sectional view of common cathode

Fig. 7. Picture of common cathode（Inset：Sectional view of the red line area）

Fig. 8. Micro-LED final chip

Fig. 9. Test chart of the different points lighting up

Fig. 10. Schemetic diagram of Micro-LED and CMOS bonding

Fig. 11. I-V characteristics of a single Micro-LED pixel