[1] Zhang Y Q, Wu R M, Zheng Z R. Freeform surface off-axis illumination design with the Monge-Ampère equation method in optical lithography[J]. Applied Optics, 53, 7296-7303(2014).

[2] Wang J, Zhang F, Song Q et al. Fabrication error analysis for diffractive optical elements used in a lithography illumination system[J]. Optical Engineering, 54, 045102(2015).

[3] Shih C T, Yu S S, Lu Y C et al. Mitigation of image contrast loss due to mask-side non-telecentricity in an EUV scanner[J]. Proceedings of SPIE, 9422, 94220Y(2015).

[4] Chen M, Zhang F, Zeng A J et al. Method of pupil shaping for off-axis illumination in optical lithography[J]. Journal of Optical Technology, 83, 154-158(2016).

[5] Shen Y J, Peng F, Zhang Z R. Efficient optical proximity correction based on semi-implicit additive operator splitting[J]. Optics Express, 27, 1520-1528(2019).

[6] Oh S, Han D D, Shim H B et al. Optical proximity correction (OPC) in near-field lithography with pixel-based field sectioning time modulation[J]. Nanotechnology, 29, 045301(2018).

[7] Wang L, Li S K, Wang X Z et al. Source mask projector optimization method of lithography tools based on particle swarm optimization algorithm[J]. Acta Optica Sinica, 37, 1022001(2017).

[8] Mao Y J, Li S K, Wang X Z et al. Lithographic tool-matching method based on differential evolution algorithm[J]. Acta Optica Sinica, 39, 1222002(2019).

[9] Mao Y J, Li S K, Wang X Z et al. Multi-parameter joint optimization for lithography based on photoresist topography model[J]. Acta Optica Sinica, 40, 0422002(2020).

[10] Cai Y M, Wang X Z, Bu Y et al. Optical design of Fourier transform lens for measurement of illumination pupil of lithography tools[J]. Chinese Journal of Lasers, 42, 0416001(2015).

[11] Chen A, Lin W M, Jiang H B. Impact of non-ideal illumination pupil on imaging performance of lithography[J]. Opto-Electronic Engineering, 40, 87-92(2013).

[12] Hu Z H, Zhu J, Yang B X et al. Far-field multi-parameter measurement of diffractive optical element for pupil shaping in lithography system[J]. Chinese Journal of Lasers, 40, 0908001(2013).

[13] Rui D W, Shi Z G, Yuan W Q et al. Pupil non-balance calibration for lithographic lens[J]. Chinese Journal of Lasers, 41, 0916002(2014).

[14] van der Lei S A, Tas M A, Hoegee J et al. Optical integrator for an illumination device: US6733165[P](2004).

[15] Antoni M et al. Projection exposure device: US6535274[P](2003).

[16] Maul M, Fiolka D. Filter device for the compensation of an asymmetric pupil illumination: US8636386[P](2014).

[17] Zhu S Y, Niu Z Y, Zhang F et al. Programmable pupil correction method for photolithography illumination system[J]. Optik, 208, 164072(2020).

[18] Zhao Y, Gong Y. Design of beam shaping unit for deep ultraviolet lithographic illumination system[J]. Optics and Precision Engineering, 19, 29-34(2011).

[19] Liu Z F, Chen M, Bu Y et al. Blade edge's penumbra measurement for scanning slit of lithographic tools[J]. Chinese Journal of Lasers, 46, 1004005(2019).

[20] Zhang F, Zhu J, Yue W R et al. An approach to increase efficiency of DOE based pupil shaping technique for off-axis illumination in optical lithography[J]. Optics Express, 23, 4482-4493(2015).

[21] Rui D W, Zhang W, Yang H J. Calibrating the pupil fill balance for hypernumerical aperture lithographic objective[J]. Optical Engineering, 54, 095103(2015).

[22] Gan Y, Zhang F, Zhu S Y et al. Evaluation algorithm of pupil characteristic parameters in lithography illumination system[J]. Chinese Journal of Lasers, 46, 0304007(2019).